The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 13, 2025

Filed:

Nov. 03, 2020
Applicant:

Merck Patent Gmbh, Darmstadt, DE;

Inventors:

Charith Nanayakkara, Haverhill, MA (US);

Joby Eldo, Andover, MA (US);

Jacob Woodruff, Lexington, MA (US);

Charles Dezelah, Haverhill, MA (US);

Shawn Sungeun Hong, Westford, MA (US);

Ravindra Kanjolia, North Andover, MA (US);

Daniel Moser, Sheboygan Falls, WI (US);

Mark C. Potyen, Sheboygan Falls, WI (US);

Assignee:

MERCK PATENT GMBH, Darmstadt, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/18 (2006.01); C23C 16/02 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45553 (2013.01); C23C 16/0272 (2013.01); C23C 16/18 (2013.01); C23C 16/45534 (2013.01);
Abstract

Compounds for selectively forming metal-containing films are provided. Methods of forming metal-containing films are also provided. The methods include forming a blocking layer, for example, on a first substrate surface, by a first deposition process and forming the metal-containing film, for example, on a second substrate surface, by a second deposition process.


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