This inventor holds 1 USPTO granted patent. Top assignee: Versum Materials US, LLC. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Jared Leith McWilliams: Innovator in Selective Thermal Atomic Layer Etching
Introduction
Jared Leith McWilliams is a notable inventor based in Royal Oaks, CA (US). He has made significant contributions to the field of materials science, particularly in the area of selective thermal atomic layer etching. His innovative approach has the potential to advance various applications in the semiconductor industry.
Latest Patents
Jared holds a patent for his invention titled "Selective Thermal Atomic Layer Etching." This patent describes a novel method that utilizes a series of halogen-free organic acids cycled with an oxidant as a co-reactant to etch metals. This innovative technique aims to improve the efficiency and effectiveness of the etching process, making it a valuable asset in the field.
Career Highlights
Jared is currently employed at Versum Materials US, LLC, where he continues to develop and refine his innovative techniques. His work at the company has positioned him as a key player in advancing material processing technologies.
Collaborations
Throughout his career, Jared has collaborated with talented professionals, including Ravindra Kanjolia and Jean-Sébastien Lehn. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Jared Leith McWilliams is a pioneering inventor whose work in selective thermal atomic layer etching showcases his commitment to advancing technology in the materials science field. His contributions are expected to have a lasting impact on the industry.