The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 2023
Filed:
Oct. 21, 2021
Versum Materials Us, Llc, Tempe, AZ (US);
Manchao Xiao, Tempe, AZ (US);
Xinjian Lei, Vista, CA (US);
Ronald Martin Pearlstein, Tempe, AZ (US);
Haripin Chandra, Tempe, AZ (US);
Eugene Joseph Karwacki, Tempe, AZ (US);
Bing Han, Tempe, AZ (US);
Mark Leonard O'Neill, Tempe, AZ (US);
Versum Materials US, LLC, Tempe, AZ (US);
Abstract
Described herein are compositions for depositing a carbon-doped silicon containing film comprising: a precursor comprising at least one compound selected from the group consisting of: an organoaminosilane having a formula of RN(SiRLH), wherein R, R, and L are defined herein. Also described herein are methods for depositing a carbon-doped silicon-containing film using the composition wherein the method is one selected from the following: cyclic chemical vapor deposition (CCVD), atomic layer deposition (ALD), plasma enhanced ALD (PEALD) and plasma enhanced CCVD (PECCVD).