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For the Inventor, By the Inventor

San Marcos, CA, United States of America

Mark Leonard O'Neill

USPTO Granted Patents = 88 

 

Average Co-Inventor Count = 5.3

ph-index = 15

Forward Citations = 2,975(Granted Patents)

Forward Citations (Not Self Cited) = 2,914(Oct 12, 2025)


Inventors with similar research interests:


Location History:

  • Austin, TX (US) (1998)
  • Allentown, PA (US) (2001 - 2015)
  • San Marcos, CA (US) (2012 - 2016)
  • San Marcos, PA (US) (2018)
  • Gilbert, AZ (US) (2015 - 2023)
  • Queen Creek, AZ (US) (2017 - 2023)
  • Tempe, AZ (US) (2019 - 2023)

Company Filing History:

goldMedal50 out of 3,186 
 
Air Products and Chemicals, Inc.
 patents
silverMedal37 out of 198 
 
Versum Materials Us, LLC
 patents
bronzeMedal1 out of 5,444 
 
University of Texas System
 patents
4. 1 out of 10,295 
 
Tokyo Electron Limited
 patents
where one patent can have more than one assignee

Years Active: 1998-2025

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88 patents (USPTO):
1. 12234383 - Low dishing oxide CMP polishing compositions for shallow trench isolation applications and methods of making thereof (2025-02-25),
2. 12230496 - Organoaminosilane precursors and methods for depositing films comprising same (2025-02-18),
3. 12091581 - High oxide film removal rate shallow trench (STI) chemical mechanical planarization (CMP) polishing (2024-09-17),
4. 11725111 - Compositions and processes for depositing carbon-doped silicon-containing films (2023-08-15),
5. 11692110 - Low oxide trench dishing chemical mechanical polishing (2023-07-04),
6. 11667839 - Low oxide trench dishing chemical mechanical polishing (2023-06-06),
7. 11643599 - Tungsten chemical mechanical polishing for reduced oxide erosion (2023-05-09),
8. 11626279 - Compositions and methods for making silicon containing films (2023-04-11),
9. 11608451 - Shallow trench isolation (STI) chemical mechanical planarization (CMP) polishing with tunable silicon oxide and silicon nitride removal rates (2023-03-21),
10. 11549034 - Oxide chemical mechanical planarization (CMP) polishing compositions (2023-01-10),
11. 11401441 - Chemical mechanical planarization (CMP) composition and methods therefore for copper and through silica via (TSV) applications (2022-08-02),
12. 11326076 - Shallow trench isolation (STI) chemical mechanical planarization (CMP) polishing with low abrasive concentration and a combination of chemical additives (2022-05-10),
13. 11254839 - Low oxide trench dishing shallow trench isolation chemical mechanical planarization polishing (2022-02-22),
14. 11180678 - Suppressing SiN removal rates and reducing oxide trench dishing for Shallow Trench Isolation (STI) process (2021-11-23),
15. 11139162 - Organoaminosilane precursors and methods for depositing films comprising same (2021-10-05),

Title: The Innovative Journey of Mark Leonard O'Neill

Introduction: Mark Leonard O'Neill is a pioneering inventor based in San Marcos, California. With a passion for creating groundbreaking solutions, O'Neill has made significant contributions to the field of innovation.

Latest Patents: Mark Leonard O'Neill holds several patents in various industries, including technology, healthcare, and environmental sustainability. His recent patents focus on enhancing efficiency in renewable energy systems and improving medical devices for patient care.

Career Highlights: Throughout his career, O'Neill has demonstrated a remarkable ability to transform ideas into tangible inventions. His innovative mindset has led to the development of cutting-edge technologies that have positively impacted numerous sectors.

Collaborations: Mark Leonard O'Neill has collaborated with leading research institutions, universities, and companies to further advance his inventions. His partnerships have been instrumental in bringing his ideas to fruition and maximizing their potential impact on society.

Conclusion: Mark Leonard O'Neill's dedication to innovation and his relentless pursuit of excellence have established him as a prominent figure in the world of inventors. His remarkable contributions continue to inspire future generations of innovators to push the boundaries of what is possible.

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