The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2022
Filed:
Dec. 12, 2019
Versum Materials Us, Llc, Tempe, AZ (US);
Xiaobo Shi, Chandler, AZ (US);
Joseph D. Rose, Gilbert, AZ (US);
Hongjun Zhou, Chandler, AZ (US);
Krishna P. Murella, Phoenix, AZ (US);
Mark Leonard O'Neill, Queen Creek, AZ (US);
VERSUM MATERIALS US, LLC, Tempe, AZ (US);
Abstract
The present invention discloses STI CMP polishing compositions, methods and systems that significantly reduce oxide trench dishing and improve over-polishing window stability in addition to provide high and tunable silicon oxide removal rates, low silicon nitride removal rates, and tunable high selectivity of SiO:SiN through the use of an unique combination of ceria inorganic oxide particles, such as ceria coated silica particles as abrasives, and an oxide trench dishing reducing additive of poly(methacrylic acids), its derivatives, its salts, or combinations thereof.