Phoenix, AZ, United States of America

Krishna P Murella

USPTO Granted Patents = 22 

 

Average Co-Inventor Count = 5.1

ph-index = 3

Forward Citations = 14(Granted Patents)


Location History:

  • Tempe, AZ (US) (2002 - 2021)
  • Phoenix, AZ (US) (2015 - 2023)

Company Filing History:


Years Active: 2002-2025

Loading Chart...
Loading Chart...
22 patents (USPTO):Explore Patents

Title: The Innovative Journey of Krishna P Murella

Introduction

Krishna P Murella, an accomplished inventor based in Phoenix, Arizona, has made significant strides in the field of chemical mechanical planarization (CMP). With 20 patents to his name, Murella's innovative contributions have greatly influenced the manufacturing processes in various technological sectors.

Latest Patents

Among his latest inventions are the "Low dishing oxide CMP polishing compositions for shallow trench isolation applications and methods of making thereof." This patent focuses on Shallow Trench Isolation (STI) CMP polishing compositions, incorporating abrasives such as ceria-coated inorganic oxide particles and dual chemical additives. These innovations are designed to optimize oxide film removal rates and enhance selectivity during the polishing process. Another noteworthy patent is the method for shared data-induced quality control for a CMP process. This development involves utilizing a data-collecting computer and machine learning to analyze and improve the CMP process's performance and the quality of the resulting products.

Career Highlights

Murella has built an impressive career with key roles in leading companies such as Versum Materials US, LLC and Air Products and Chemicals, Inc. His expertise in chemical engineering and material science has enabled him to drive forward-thinking solutions in CMP technology, eventually securing numerous patents that reflect his significant impact on the industry.

Collaborations

Throughout his career, Murella has collaborated with talented professionals, including Hongjun Zhou and Xiaobo Shi. These partnerships emphasize the collaborative nature of innovation in the field and bolster the effectiveness of Murella's inventive processes.

Conclusion

Krishna P Murella's contributions to innovations in CMP technology are invaluable. With a strong portfolio of patents and a commitment to advancing manufacturing processes, Murella exemplifies the spirit of modern invention. His work continues to influence various applications in the industry, ensuring that he remains a notable figure among inventors dedicated to pushing the boundaries of technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…