The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2022
Filed:
Jan. 08, 2020
Versum Materials Us, Llc, Tempe, AZ (US);
Xiaobo Shi, Chandler, AZ (US);
Krishna P. Murella, Phoenix, AZ (US);
Joseph D. Rose, Gilbert, AZ (US);
Hongjun Zhou, Chandler, AZ (US);
Mark Leonard O'Neill, Queen Creek, AZ (US);
VERSUM MATERIALS US, LLC, Tempe, AZ (US);
Abstract
Shallow Trench Isolation (STI) chemical mechanical planarization (CMP) polishing compositions, methods and systems of use therefore are provided. The CMP polishing composition comprises abrasives of ceria coated inorganic metal oxide particles, such as ceria-coated silica; and dual chemical additives for providing high oxide film removal rate. The dual chemical additives comprise gelatin compounds possessing negative and positive charges on the same molecule, and non-ionic organic molecules having multi hydroxyl functional groups in the same molecule.