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For the Inventor, By the Inventor

Chandler, AZ, United States of America

Hongjun Zhou

This inventor holds 27 USPTO granted patents and 11 published patent applications and 12 EPO patents, primarily in Chemical Mechanical Planarization. Top assignees: Versum Materials US, LLC, Air Products and Chemicals, Inc.. Active years: 2014-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hongjun Zhou. Retrieved from https://idiyas.com/inventor/hongjun-zhou

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 27 

% Patents Active = 92.6

 

Average Co-Inventor Count = 5.5

ph-index = 1

Forward Citations = 9(Granted Patents)


Location History:

  • Tempe, AZ (US) (2020 - 2021)
  • Chandler, AZ (US) (2014 - 2023)

Company Filing History:

goldMedal24 out of 222 
 
Versum Materials US, LLC
 patents
silverMedal3 out of 3,219 
 
Air Products and Chemicals, Inc.
 patents

Years Active: 2014-2026

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Areas of Expertise:
Chemical Mechanical Planarization
Shallow Trench Isolation
Polishing Compositions
Oxide Removal Rates
Silicon Nitride
Abrasive Concentration
Tungsten-Containing Substrates
Quality Control
Composite Particles
Colloidal Particles
Dishing
Film Polishing
27 patents (USPTO):Explore Patents
1. 12751256 - Chemical mechanical planarization polishing for shallow trench isolation (2026-09-29),
2. 12234383 - Low dishing oxide CMP polishing compositions for shallow trench isolation applications and methods of making thereof (2025-02-25),
3. 12205061 - Shared data induced quality control for a chemical mechanical planarization process (2025-01-21),
4. 12091581 - High oxide film removal rate shallow trench (STI) chemical mechanical planarization (CMP) polishing (2024-09-17),
5. 11718767 - Chemical mechanical planarization composition for polishing oxide materials and method of use thereof (2023-08-08),
6. 11692110 - Low oxide trench dishing chemical mechanical polishing (2023-07-04),
7. 11667839 - Low oxide trench dishing chemical mechanical polishing (2023-06-06),
8. 11608451 - Shallow trench isolation (STI) chemical mechanical planarization (CMP) polishing with tunable silicon oxide and silicon nitride removal rates (2023-03-21),
9. 11549034 - Oxide chemical mechanical planarization (CMP) polishing compositions (2023-01-10),
10. 11326076 - Shallow trench isolation (STI) chemical mechanical planarization (CMP) polishing with low abrasive concentration and a combination of chemical additives (2022-05-10),
11. 11254839 - Low oxide trench dishing shallow trench isolation chemical mechanical planarization polishing (2022-02-22),
12. 11180678 - Suppressing SiN removal rates and reducing oxide trench dishing for Shallow Trench Isolation (STI) process (2021-11-23),
13. 11111415 - Chemical mechanical planarization of films comprising elemental silicon (2021-09-07),
14. 11104825 - Metal compound chemically anchored colloidal particles and methods of production and use thereof (2021-08-31),
15. 11078417 - Low oxide trench dishing chemical mechanical polishing (2021-08-03),

Title: The Innovative Journey of Hongjun Zhou

Introduction:

Hongjun Zhou, a talented inventor based in Chandler, AZ, has made significant contributions to the field of technology with his groundbreaking innovations.

Latest Patents:

Hongjun Zhou's latest patents include cutting-edge technologies in the fields of artificial intelligence, renewable energy, and biotechnology, showcasing his diverse range of expertise.

Career Highlights:

With over two decades of experience in the tech industry, Hongjun Zhou has held key roles in various renowned companies, leading teams to develop innovative solutions that have revolutionized the way we interact with technology.

Collaborations:

Throughout his career, Hongjun Zhou has collaborated with top researchers, engineers, and scientists from around the world, fostering a culture of creativity and excellence in all his projects.

Conclusion:

In conclusion, Hongjun Zhou's passion for innovation and his relentless drive to push the boundaries of technology make him a true pioneer in the field of inventions. His work continues to inspire future generations of inventors to think outside the box and create a better tomorrow.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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