The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 2026
Filed:
Sep. 27, 2022
Versum Materials Us, Llc, Tempe, AZ (US);
Hongjun Zhou, Chandler, AZ (US);
Krishna P. Murella, Phoenix, AZ (US);
Xiaobo Shi, Chandler, AZ (US);
Joseph D. Rose, Gilbert, AZ (US);
Versum Materials US LLC, Tempe, AZ (US);
Abstract
The present invention discloses Shallow Trench Isolation (STI) Chemical Mechanical Planarization (CMP) polishing compositions, methods and systems that offer high and tunable Oxide: SiN and Oxide: Poly-Si removal selectivity, and low oxide trench dishing at different pH conditions in addition to suppressed Poly-Si removal rates. The polishing compositions comprise abrasive particles such as calcined ceria, and at least two preferably at least three chemical additives. The additives are (1) chemicals such as D-mannose, L-mannose, ribitol (D-ribitol), xylitol, meso-erythritol, D-sorbitol, mannitol, dulcitol, iditol, maltitol, fructose, sorbitan, sucrose, D-ribose, inositol, and glucose; (2) polyacrylic acid or polyacrylate and its ammonium, potassium or sodium salt, and (3) polyethylene glycol (PEG) with different molecular weight distributions as film selectivity tuning and oxide trench dishing reducing additives.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile