The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2022
Filed:
Aug. 23, 2019
Applicant:
Versum Materials Us, Llc, Tempe, AZ (US);
Inventor:
Ronald Martin Pearlstein, San Marcos, CA (US);
Assignee:
Versum Materials US, LLC, Tempe, AZ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/3105 (2006.01); C23C 16/455 (2006.01); C23C 16/02 (2006.01); C23C 16/34 (2006.01);
U.S. Cl.
CPC ...
H01L 21/3105 (2013.01); C23C 16/0245 (2013.01); C23C 16/345 (2013.01); C23C 16/45553 (2013.01); H01L 21/0206 (2013.01);
Abstract
A method for selectively passivating a surface of a substrate, wherein the surface of the substrate includes at least a first surface comprising silicon nitride and at least a second surface comprising a material other than silicon nitride. The method includes the step of exposing the surface to at least one organoisocyanate wherein the organoisocyanate selectively reacts with the silicon nitride to passivate the first surface thereby leaving the second surface substantially unreacted.