The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2026
Filed:
Jul. 23, 2021
Applicant:
Versum Materials Us, Llc, Tempe, AZ (US);
Inventors:
Matthew R. Macdonald, Mission Viejo, CA (US);
Manchao Xiao, San Diego, CA (US);
Assignee:
Versum Materials US, LLC, Tempe, AZ (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/14 (2006.01); C07F 7/10 (2006.01); C23C 16/02 (2006.01); C23C 16/18 (2006.01); C23C 16/40 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/14 (2013.01); C07F 7/10 (2013.01); C23C 16/0272 (2013.01); C23C 16/18 (2013.01); C23C 16/402 (2013.01); C23C 16/45534 (2013.01); C23C 16/45553 (2013.01);
Abstract
Precursors and methods for (a) forming silicon-containing films and (b) functionalizing substrate surfaces in order to generate a germanium seed layer suitable for deposition of Ge films. In one aspect, there is provided a precursor of Formula I and/or a precursor of Formula II: as described herein.