Chupei, Taiwan

Yi-Chia Lee

USPTO Granted Patents = 29 


Average Co-Inventor Count = 3.8

ph-index = 2

Forward Citations = 28(Granted Patents)


Location History:

  • Dansheui Jen, TW (2014)
  • Danshuei Jen Taipei, TW (2013 - 2015)
  • Hsin Chu, TW (2021)
  • Danshu, TW (2021)
  • Chupei, TW (2016 - 2024)

Company Filing History:


Years Active: 2013-2025

where 'Filed Patents' based on already Granted Patents

29 patents (USPTO):

Title: Innovator Spotlight: Yi-Chia Lee

Introduction

Yi-Chia Lee, based in Chupei, Taiwan, is a prominent inventor with an impressive portfolio of 27 patents. His innovative contributions primarily revolve around the fields of semiconductor manufacturing and chemical engineering. With a keen interest in wet etchants and silicon nitride removal processes, Lee has made significant strides in enhancing the efficiency of manufacturing processes within the microelectronics industry.

Latest Patents

Lee's latest patents showcase his expertise and inventive spirit. One of his notable inventions is a "Co/Cu selective wet etchant," which presents a unique formulation that allows for high etching rates of copper and cobalt, with adjustable etching rate ratios. This invention involves a sophisticated combination of alkanolamines, pH adjusters, chelating agents, and water, all tailored for precise etching applications.

Another critical patent by Lee involves an "Etching composition and method for selectively removing silicon nitride during the manufacture of a semiconductor device." This patent details an etching composition that includes phosphoric acid and a mixture that contains silicon-containing compounds and aqueous solvents. This technology is particularly useful for selectively removing silicon nitride over silicon oxide from microelectronic devices, showcasing Lee's ability to address specific challenges in semiconductor manufacturing.

Career Highlights

Throughout his career, Yi-Chia Lee has held positions at well-known companies in the industry. He has worked at Versum Materials US, LLC, and Air Products and Chemicals, Inc., where he contributed to various innovative projects. His experience in these organizations has allowed him to hone his skills and make meaningful contributions to the field of semiconductor technologies.

Collaborations

Lee has collaborated with other talented professionals, including Wen Dar Liu and Tianniu Chen. These partnerships have facilitated the exchange of ideas and further innovation in their respective fields. Working alongside such accomplished colleagues has enhanced his ability to develop cutting-edge technologies in semiconductor manufacturing.

Conclusion

Yi-Chia Lee's extensive patent portfolio and his dedication to innovation highlight his significant contributions to the field of microelectronics. His latest inventions, which focus on improving etching techniques, demonstrate his commitment to advancing semiconductor manufacturing processes. As he continues to push the boundaries of innovation, Lee remains a notable figure deserving of recognition in the world of inventors.

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