The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 08, 2024

Filed:

Sep. 30, 2020
Applicant:

Versum Materials Us, Llc, Tempe, AZ (US);

Inventors:

Chung-Yi Chang, New Taipei, TW;

Wen Dar Liu, Chupei, TW;

Yi-Chia Lee, Chupei, TW;

Assignee:

Versum Materials US, LLC, Tempe, AZ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 13/08 (2006.01); C09K 13/06 (2006.01); H01L 21/3213 (2006.01);
U.S. Cl.
CPC ...
C09K 13/08 (2013.01); C09K 13/06 (2013.01); H01L 21/32134 (2013.01);
Abstract

The disclosed and claimed subject matter relates to wet etchants exhibiting high copper and cobalt etching rates where the etching rate ratio between the two metals can be varied. The wet etchants have a composition comprising a formulation consisting of: at least one alkanolamine having at least two carbon atoms, at least one amino substituent and at least one hydroxyl substituent with the amino and hydroxyl substituents attached to two different carbon atoms; at least one pH adjuster for adjusting the pH of the formulation to between approximately 9 and approximately 12; at least one chelating agent; and water.


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