Chung-Yi Chang

Title: Innovations of Chung-Yi Chang

Introduction

Chung-Yi Chang is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of microelectronics through his innovative patents. With a total of 3 patents, his work focuses on developing advanced etching solutions that enhance the manufacturing processes in the semiconductor industry.

Latest Patents

One of his latest patents is a Co/Cu selective wet etchant. This invention relates to wet etchants that exhibit high etching rates for both copper and cobalt, allowing for a variable etching rate ratio between the two metals. The formulation includes at least one alkanolamine with specific structural characteristics, a pH adjuster to maintain a pH between approximately 9 and 12, a chelating agent, and water.

Another significant patent is an etching solution that includes a silicon oxide corrosion inhibitor. This solution is designed for the selective removal of polysilicon over silicon oxide from microelectronic devices. It comprises water, a quaternary ammonium hydroxide compound, and various nitrogen-containing compounds, among other components. This innovative solution enhances the efficiency and effectiveness of microelectronic device fabrication.

Career Highlights

Chung-Yi Chang is currently employed at Versum Materials US, LLC, where he continues to develop cutting-edge technologies in the field of etching solutions. His expertise and innovative mindset have positioned him as a valuable asset in the semiconductor industry.

Collaborations

Chung-Yi has collaborated with notable coworkers such as Wen Dar Liu and Yi-Chia Lee. Their combined efforts contribute to the advancement of technologies in microelectronics.

Conclusion

Chung-Yi Chang's contributions to the field of microelectronics through his innovative patents demonstrate his commitment to advancing technology. His work not only enhances manufacturing processes but also sets a foundation for future innovations in the industry.