The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 2019
Filed:
Jun. 22, 2017
Applicant:
Versum Materials Us, Llc, Allentown, PA (US);
Inventors:
Matthias Stender, Phoenix, AZ (US);
Maitland Gary Graham, Tempe, AZ (US);
Dnyanesh Chandrakant Tamboli, Gilbert, AZ (US);
Xiaobo Shi, Chandler, AZ (US);
Assignee:
VERSUM MATERIALS US, LLC, Tempe, AZ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/02 (2006.01); B24B 37/04 (2012.01); C09K 3/14 (2006.01); H01L 21/321 (2006.01); H01L 21/768 (2006.01); C09G 1/00 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); B24B 37/044 (2013.01); C09G 1/00 (2013.01); C09K 3/1463 (2013.01); H01L 21/3212 (2013.01); H01L 21/7684 (2013.01);
Abstract
A barrier chemical mechanical planarization polishing composition is provided that includes suitable chemical additives. The suitable chemical additives are silicate compound and high molecular weight polymers/copolymers. There is also provided a chemical mechanical polishing method using the barrier chemical mechanical planarization polishing composition.