Tempe, AZ, United States of America

Maitland Gary Graham

USPTO Granted Patents = 4 

 

Average Co-Inventor Count = 3.1

ph-index = 2

Forward Citations = 13(Granted Patents)


Location History:

  • Phoenix, AZ (US) (2015 - 2017)
  • Tempe, AZ (US) (2018 - 2019)

Company Filing History:


Years Active: 2015-2019

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4 patents (USPTO):Explore Patents

Title: The Innovative Journey of Maitland Gary Graham

Introduction

Maitland Gary Graham, an accomplished inventor based in Tempe, AZ, has made significant contributions to the field of chemical mechanical planarization (CMP). With four patents to his name, Graham’s work emphasizes the development of advanced polishing compositions and methods essential for semiconductor manufacturing.

Latest Patents

Among Graham’s latest inventions is the patent for "Additives for Barrier Chemical Mechanical Planarization." This innovative polishing composition includes an effective blend of chemical additives, notably silicate compounds and high molecular weight polymers/copolymers. Additionally, Graham has developed a method for chemical mechanical polishing using this composition to enhance efficiency. Another significant patent is the "Stop-on Silicon Containing Layer Additive," which focuses on CMP compositions, methods, and systems designed for polishing patterned semiconductor wafers. This invention incorporates an abrasive and a water-soluble aluminum compound additive with a pH greater than 7 to control the removal rate of a silicon-containing layer, such as silicon nitride, silicon oxide, or silicon carbide. The CMP compositions may also include surfactants and corrosion inhibitors, demonstrating Graham's commitment to innovation in the CMP space.

Career Highlights

Graham’s career includes notable positions at various prestigious companies, including Versum Materials US, LLC, and Air Products and Chemicals, Inc. His work in these organizations has significantly contributed to the field of semiconductor technology, focusing on enhancing materials and processes.

Collaborations

Throughout his career, Graham has collaborated with fellow innovators, including Xiaobo Shi and Matthias Stender. These partnerships have fostered an environment of creativity and advancement, enabling the development of breakthrough technologies in the semiconductor industry.

Conclusion

Maitland Gary Graham’s inventive spirit and dedication to advancing CMP technologies have established him as a prominent figure in his field. With his innovative patents and collaborative efforts, he continues to pave the way for advancements that promise to enhance the efficiency and effectiveness of semiconductor manufacturing processes. His work exemplifies the impact of innovation on technology and industry.

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