Company Filing History:
Years Active: 1992-2025
Title: Masaru Shinomiya: A Pioneer in Epitaxial Wafer Technology
Introduction
Masaru Shinomiya, based in Annaka, Japan, is a prominent inventor in the field of semiconductor technology. With a remarkable portfolio of 18 patents, his contributions have significantly advanced the manufacturing processes in the semiconductor industry.
Latest Patents
Shinomiya’s latest breakthroughs include innovative methods that enhance the production of epitaxial wafers. One such patent outlines a method for manufacturing an epitaxial wafer that involves preparing a silicon-based substrate with a chamfered portion, forming an annular trench in that chamfered section, and performing epitaxial growth. This method effectively suppresses the propagation of cracks from the peripheral chamfered region towards the center, improving the durability of the wafers.
Additionally, he has developed a semiconductor device substrate featuring a buffer layer made of a nitride semiconductor, which addresses issues related to transverse and longitudinal leak currents. This innovation enables enhanced performance of semiconductor devices under high-temperature conditions, mitigating the risk of current collapse phenomena.
Career Highlights
Masaru Shinomiya has made a notable impact by working with leading companies in the industry, including Shin-Etsu Handotai Co., Ltd. and Sanken Electric Co., Ltd. His experience in these organizations has equipped him with the knowledge necessary to drive forward the technologies surrounding semiconductor devices.
Collaborations
Throughout his career, Shinomiya has collaborated with renowned professionals such as Kazunori Hagimoto and Keitaro Tsuchiya. These collaborative efforts have fostered innovation and the sharing of ideas, further advancing the field of semiconductor technology.
Conclusion
Masaru Shinomiya's innovative approaches to manufacturing processes in semiconductor technology have positioned him as a significant figure in his field. With a solid foundation of 18 patents and a commitment to excellence, he continues to shape the future of semiconductor design and production.
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