Location History:
- Tokyo, JP (1997 - 1998)
- Beverly, MA (US) (2006)
- Nirasaki, JP (2007)
- Yamanashi, JP (2003 - 2009)
- Peabody, MA (US) (2008 - 2011)
- Yamanashi-Ken, JP (2009 - 2014)
Company Filing History:
19 out of 10,326 
4 out of 52,735 
1 out of 71 
Years Active: 1997-2014
Title: Innovations and Achievements of Koichiro Inazawa
Introduction
Koichiro Inazawa, an esteemed inventor from Yamanashi, Japan, has made significant contributions to the field of plasma etching technology. With a remarkable track record of 19 patents, Inazawa's inventions showcase his commitment to advancing industrial processes and materials science.
Latest Patents
Among his latest innovations, Inazawa has filed patents for groundbreaking techniques in plasma etching. One notable invention is a plasma etching method that includes arranging a pair of electrodes oppositely in a chamber, with one electrode supporting a substrate. The method cleverly employs a high-frequency electric field to selectively plasma-etch an organic-material film on the substrate while preserving an inorganic-material film. This process utilizes a frequency range of 50 to 150 MHz to optimize etching performance.
Another significant patent details a method and apparatus for multilayer photoresist dry development. This technique involves using a plasma processing system to etch an organic anti-reflective coating layer on a substrate. By introducing a process gas, including ammonia and hydrocarbon gases, the system effectively generates plasma to achieve precise etching results. The invention also includes a method for creating a bilayer mask for etching thin films, demonstrating Inazawa’s comprehensive approach to solving complex material challenges.
Career Highlights
Koichiro Inazawa has worked with renowned companies including Tokyo Electron Limited and Kabushiki Kaisha Toshiba. His experiences at these leading firms have undoubtedly shaped his innovative mindset and technical expertise, allowing him to pioneer advancements in plasma etching technology.
Collaborations
Throughout his career, Inazawa collaborated with notable professionals, including Shin Okamoto and Vaidyanathan Balasubramaniam. These partnerships have further enriched his work, fostering an environment of creativity and exchange of ideas that is vital for innovation in technology.
Conclusion
Koichiro Inazawa exemplifies the spirit of innovation in the field of plasma processing. With a substantial portfolio of patents and collaborations with industry leaders, his contributions continue to shape the future of materials science and processing technologies. His work not only enhances industrial applications but also paves the way for future inventions in the field.