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Nirasaki, Japan

Tokyo Electron Yamanashi Limited

USPTO Granted Patents = 71

Forward Citations = 5,564

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137 inventors (with patents filed for the assignee):

Shigeki Tozawa (6 out of 13 patents)

Kazuo Fukasawa (5 out of 9 patents)

Shunichi Iimuro (5 out of 6 patents)

4. Hisashi Nakajima (5 out of 7 patents)

5. Satoru Yamashita (4 out of 15 patents)

6. Chishio Koshimizu (4 out of 170 patents)

7. Eiichi Nishimura (4 out of 84 patents)

8. Haruhiko Yoshioka (4 out of 15 patents)

9. Shozo Hosoda (4 out of 4 patents)

10. Masashi Arasawa (4 out of 4 patents)

11. Yoshikazu Ito (4 out of 4 patents)

12. Tutomu Hiroki (4 out of 4 patents)

13. Hiroshi Nishikawa (3 out of 58 patents)

14. Kazuya Nagaseki (3 out of 76 patents)

15. Yoshio Fukasawa (3 out of 6 patents)

Core Competencies:

Plasma Processing Apparatus

Etching Method

Sputtering Method

Endpoint Detection

Anisotropic Etching

Electrostatic Chuck

Vacuum Processing

Probe Apparatus

Thin Film Formation

Multi-Chamber System

Electron Beam Plasma

Wafer Probing

71 patents: Sort by Forward Citations

1. 6162323 - Plasma processing apparatus (2000-12-19),

2. 6149760 - Plasma processing apparatus (2000-11-21),

3. 6110287 - Plasma processing method and plasma processing apparatus (2000-08-29),

4. 6101970 - Plasma processing apparatus (2000-08-15),

5. 6096176 - Sputtering method and a sputtering apparatus thereof (2000-08-01),

6. 6079357 - Plasma processing apparatus (2000-06-27),

7. 6074518 - Plasma processing apparatus (2000-06-13),

8. 5980767 - Method and devices for detecting the end point of plasma process (1999-11-09),

9. 5958258 - Plasma processing method in semiconductor processing system (1999-09-28),

10. 5804983 - Probe apparatus with tilt correction mechanisms (1998-09-08),

11. 5779803 - Plasma processing apparatus (1998-07-14),

12. 5766498 - Anisotropic etching method and apparatus (1998-06-16),

13. 5728253 - Method and devices for detecting the end point of plasma process (1998-03-17),

14. 5717294 - Plasma process apparatus (1998-02-10),

15. 5708222 - Inspection apparatus, transportation apparatus, and temperature control (1998-01-13),

Company Overview

Tokyo Electron Yamanashi Limited, located in Nirasaki, Japan, specializes in advanced plasma processing technologies essential for semiconductor manufacturing. The company focuses on developing and manufacturing equipment for plasma processing, including etching and sputtering methods, as well as endpoint detection systems. Their expertise extends to anisotropic etching, electrostatic chucks, and vacuum processing solutions, positioning them as a key player in the semiconductor supply chain and contributing to innovations in the field.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 20 2026

71 Patents

#1 in Nirasaki

#1,403 in Japan

#10,513 in the World

Nirasaki, Japan

Tokyo Electron Yamanashi Limited

Forward Citations = 5,564

137 inventors:

Shigeki Tozawa (6 out of 13 patents)

Kazuo Fukasawa (5 out of 9 patents)

Shunichi Iimuro (5 out of 6 patents)

4. Hisashi Nakajima (5 out of 7 patents)

5. Satoru Yamashita (4 out of 15 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Tokyo Electron Yamanashi Limited. Retrieved from https://idiyas.com/company/tokyo-electron-yamanashi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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