The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 27, 2000
Filed:
Oct. 15, 1998
Applicant:
Inventor:
Kiichi Hama, Chino, JP;
Assignees:
Tokyo Electron Yamanashi Limited, Nirasaki, JP;
Japan Science and Technology Corporation, Kawaguchi, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ; H05H / ;
U.S. Cl.
CPC ...
1187 / ; 156345 ;
Abstract
An inductively coupled type dry etching apparatus has an RF antenna disposed on the ceiling wall of a process chamber. A susceptor is arranged in the process chamber, for mounting a semiconductor wafer thereon. The ceiling wall has a matrix of alumina ceramic, and heat generating elements of a salt of a transition metal oxide, which are dispersed in the matrix and capable of self-generating heat by an RF electric field.