The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 2000
Filed:
Jan. 04, 1999
Kosuke Imafuku, Kofu, JP;
Shosuke Endo, Kofu, JP;
Kazuhiro Tahara, Nirasaki, JP;
Hiroshi Tsuchiya, Yamanashi-ken, JP;
Masayuki Tomoyasu, Nirasaki, JP;
Yukio Naito, Kofu, JP;
Kazuya Nagaseki, Yamanashi-ken, JP;
Ryo Nonaka, Yamanashi-ken, JP;
Keizo Hirose, Kofu, JP;
Yoshio Fukasawa, Kofu, JP;
Akira Koshiishi, Kofu, JP;
Isao Kobayashi, Yamanashi-ken, JP;
Tokyo Electron Limited, Tokyo, JP;
Tokyo Electron Yamanashi Limited, Nirasaki, JP;
Abstract
A plasma processing apparatus comprises a chamber, and an upper electrode and a lower electrode, parallelly provided in the chamber to oppose each other at a predetermined interval, for defining a plasma generation region between the electrodes. An object to be processed is mounted on the lower electrode. RF powers are supplied to the electrodes, so that a plasma generates between the electrodes, thereby performing a plasma process with respect to the object to be processed. A cylindrical ground electrode is provided around the plasma generation region in the chamber, for enclosing the plasma in the plasma generation region, and has a plurality of through holes for passing a process gas.