Nirasaki, Japan

Kazuhiro Tahara


Average Co-Inventor Count = 9.6

ph-index = 6

Forward Citations = 375(Granted Patents)


Company Filing History:


Years Active: 1997-2003

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6 patents (USPTO):Explore Patents

Title: Kazuhiro Tahara: Innovator in Plasma Treatment Technology

Introduction

Kazuhiro Tahara is a notable inventor based in Nirasaki, Japan. He has made significant contributions to the field of plasma treatment technology, holding a total of 6 patents. His innovative approaches have advanced the methods and apparatus used in substrate treatment.

Latest Patents

Tahara's latest patents include a plasma treatment method and apparatus designed for efficient substrate processing. One of his inventions features an apparatus that includes a chamber with an opening, allowing for the conveyance of substrates. The chamber is equipped with a detachable baffle plate that fits around an electrode. This design enables the substrate to be placed on the electrode while controlling the gas environment within the chamber. The baffle plate can be adjusted to shield specific areas, allowing reaction products to adhere to it. Another patent describes a plasma treatment method that involves decompressing a process chamber, mounting a wafer on a suscepter, and applying high-frequency power to generate plasma. This method enhances the activation of species that influence the wafer.

Career Highlights

Throughout his career, Kazuhiro Tahara has worked with prominent companies in the semiconductor industry, including Tokyo Electron Limited and Tokyo Electron Yamanashi Limited. His experience in these organizations has allowed him to develop and refine his innovative technologies.

Collaborations

Tahara has collaborated with talented individuals in his field, including Kosuke Imafuku and Shosuke Endo. These partnerships have contributed to the advancement of plasma treatment technologies and have fostered a collaborative environment for innovation.

Conclusion

Kazuhiro Tahara's contributions to plasma treatment technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in substrate treatment processes. Through his work, he continues to influence the semiconductor industry positively.

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