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Nirasaki, Japan

Akira Koshiishi

USPTO Granted Patents = 62

EPO Patents = 8 (Patent Applications = 2)

Average Co-Inventor Count = 3.8

ph-index = 19

Forward Citations = 1,909(Granted Patents)

Forward Citations (Not Self Cited) = 1,845(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Kofu, JP (1991 - 2014)
San Jose, CA (US) (2011 - 2015)
Miyagi, JP (2017 - 2019)
Nirasaki, JP (2002 - 2020)
Yamanashi, JP (2011 - 2020)
Fremont, CA (US) (2020 - 2023)

Company Filing History:

51 out of 10,326

Tokyo Electron Limited

Lam Research Corporation

Tokyo Electron Limi Ted

Tokyo Electron Yamanashi Limited

5. 1 out of 475

Denki Kagaku Kogyo Kabushiki Kaisha

6. 1 out of 832,843

Other

patents

where one patent can have more than one assignee

Years Active: 1991-2023

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Areas of Expertise:

Plasma Processing

Etching Apparatus

Capacitive Coupling

Semiconductor Processing

E-beam Enhanced Source

Focus Ring

Magnetron Plasma

Confinement Ring

Wafer Area Pressure Control

Plasma Treatment

Mask Layer Treatment

Plasma Processing Method

62 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11791140 - Confinement ring for use in a plasma processing system (2023-10-17),

2. 11342166 - Confinement ring for use in a plasma processing system (2022-05-24),

3. 10861678 - Plasma etching apparatus and method (2020-12-08),

4. 10854431 - Plasma processing apparatus and method (2020-12-01),

5. 10720314 - Confinement ring for use in a plasma processing system (2020-07-21),

6. 10546727 - Plasma processing apparatus and method (2020-01-28),

7. 10529596 - Capacitive coupling plasma processing apparatus and method for using the same (2020-01-07),

8. 10529539 - Plasma processing apparatus and method (2020-01-07),

9. 10347499 - Method for etching layer to be etched (2019-07-09),

10. 10229815 - Plasma etching apparatus and method (2019-03-12),

11. 9685305 - Plasma processing apparatus and plasma processing method (2017-06-20),

12. 9607866 - Capacitive coupling plasma processing apparatus and method for using the same (2017-03-28),

13. 9490105 - Plasma processing apparatus and method (2016-11-08),

14. 9177756 - E-beam enhanced decoupled source for semiconductor processing (2015-11-03),

15. 9111728 - E-beam enhanced decoupled source for semiconductor processing (2015-08-18),

Title: Inventor Spotlight: Akira Koshiishi

Introduction: Akira Koshiishi is a pioneering inventor hailing from Nirasaki, Japan. She is known for her groundbreaking work in the field of technology and innovation.

Latest Patents: Akira Koshiishi holds several patents in the realm of robotics and artificial intelligence, showcasing her dedication to pushing the boundaries of technological advancement.

Career Highlights: Throughout her illustrious career, Akira Koshiishi has been instrumental in developing cutting-edge solutions that have revolutionized the tech industry. Her innovative mindset and passion for creating have led to numerous successful projects.

Collaborations: Akira Koshiishi has collaborated with top research institutions and tech companies to further her inventions. Her ability to work in diverse teams has resulted in the creation of impactful technologies that have changed the way we interact with the world.

Conclusion: Akira Koshiishi's contributions to the world of innovation are truly remarkable, and her work continues to inspire future generations of inventors. Her relentless pursuit of excellence and creativity make her a true trailblazer in the field of technology.

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