Akira Koshiishi

This inventor holds 62 USPTO granted patents and 8 EPO patents, primarily in Plasma Processing (CPC class H01J). Top assignees: Tokyo Electron Limited, Lam Research Corporation, Tokyo Electron Limi Ted. Active years: 1991-2023.

USPTO Granted Patents = 62

% Patents Active = 79.0

EPO Patents = 8 (Patent Applications = 2)

Average Co-Inventor Count = 3.8

ph-index = 20

Forward Citations = 1,934(Granted Patents)

Forward Citations (Not Self Cited) = 1,845(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Kofu, JP (1991 - 2014)
San Jose, CA (US) (2011 - 2015)
Miyagi, JP (2017 - 2019)
Nirasaki, JP (2002 - 2020)
Yamanashi, JP (2011 - 2020)
Fremont, CA (US) (2020 - 2023)

Company Filing History:

51 out of 10,883

Tokyo Electron Limited

patents

8 out of 3,940

Lam Research Corporation

patents

2 out of 103

Tokyo Electron Limi Ted

patents

4. 1 out of 475

Denki Kagaku Kogyo Kabushiki Kaisha

patents

5. 1 out of 71

Tokyo Electron Yamanashi Limited

patents

6. 1 out of 834,453

Other

patents

where one patent can have more than one assignee

Years Active: 1991-2023

Loading Chart...

Areas of Expertise:

Plasma Processing

Etching Apparatus

Confinement Ring

Capacitive Coupling

Semiconductor Processing

E-beam Source

Wafer Pressure Control

Radical Control

Mask Layer Treatment

Focus Ring

Plasma Processing Method

Electrode Plate

62 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11791140 - Confinement ring for use in a plasma processing system (2023-10-17),

2. 11342166 - Confinement ring for use in a plasma processing system (2022-05-24),

3. 10861678 - Plasma etching apparatus and method (2020-12-08),

4. 10854431 - Plasma processing apparatus and method (2020-12-01),

5. 10720314 - Confinement ring for use in a plasma processing system (2020-07-21),

6. 10546727 - Plasma processing apparatus and method (2020-01-28),

7. 10529596 - Capacitive coupling plasma processing apparatus and method for using the same (2020-01-07),

8. 10529539 - Plasma processing apparatus and method (2020-01-07),

9. 10347499 - Method for etching layer to be etched (2019-07-09),

10. 10229815 - Plasma etching apparatus and method (2019-03-12),

11. 9685305 - Plasma processing apparatus and plasma processing method (2017-06-20),

12. 9607866 - Capacitive coupling plasma processing apparatus and method for using the same (2017-03-28),

13. 9490105 - Plasma processing apparatus and method (2016-11-08),

14. 9177756 - E-beam enhanced decoupled source for semiconductor processing (2015-11-03),

15. 9111728 - E-beam enhanced decoupled source for semiconductor processing (2015-08-18),

Title: Inventor Spotlight: Akira Koshiishi

Introduction: Akira Koshiishi is a pioneering inventor hailing from Nirasaki, Japan. She is known for her groundbreaking work in the field of technology and innovation.

Latest Patents: Akira Koshiishi holds several patents in the realm of robotics and artificial intelligence, showcasing her dedication to pushing the boundaries of technological advancement.

Career Highlights: Throughout her illustrious career, Akira Koshiishi has been instrumental in developing cutting-edge solutions that have revolutionized the tech industry. Her innovative mindset and passion for creating have led to numerous successful projects.

Collaborations: Akira Koshiishi has collaborated with top research institutions and tech companies to further her inventions. Her ability to work in diverse teams has resulted in the creation of impactful technologies that have changed the way we interact with the world.

Conclusion: Akira Koshiishi's contributions to the world of innovation are truly remarkable, and her work continues to inspire future generations of inventors. Her relentless pursuit of excellence and creativity make her a true trailblazer in the field of technology.