Yamanashi-ken, Japan

Shunichi Iimuro


Average Co-Inventor Count = 7.6

ph-index = 6

Forward Citations = 793(Granted Patents)


Location History:

  • Yamanashi, JP (1989 - 1995)
  • Yamanashi-ken, JP (1997 - 2000)

Company Filing History:


Years Active: 1989-2000

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6 patents (USPTO):Explore Patents

Title: Shunichi Iimuro: Pioneer in Plasma Processing Technologies

Introduction

Shunichi Iimuro, an esteemed inventor based in Yamanashi-ken, Japan, has made significant contributions to the field of plasma processing. With a total of six patents to his name, his innovative work is helping to advance technologies that play a crucial role in the semiconductor manufacturing industry.

Latest Patents

Among Iimuro's latest inventions is a novel plasma processing method and apparatus. This method involves supplying high-frequency power to a processing chamber where an object is mounted, generating plasma that processes the object in its atmosphere. Notably, the power is modulated by a low-frequency signal to enhance efficiency. In one of the embodiments, the design allows the plasma to be produced by alternating the direction of current over time, with frequency modulation applied to the base power.

Additionally, Iimuro holds a patent for an anisotropic etching method and apparatus. This technology utilizes a parallel-plate plasma etching apparatus, featuring a susceptor electrode and a shower electrode. A semiconductor wafer is placed on the susceptor, while the shower region, equipped with multiple gas supply holes, works to achieve even etching across the wafer's surface. The design effectively manages temperature gradients through innovative cooling solutions, ensuring uniform etching characteristics on the wafer.

Career Highlights

Shunichi Iimuro has had an impressive career, primarily associated with companies such as Tokyo Electron Limited and Tokyo Electron Yamanashi Limited. His work at these companies has allowed him to refine his expertise and contribute to groundbreaking advancements in semiconductor technologies.

Collaborations

Throughout his career, Iimuro has collaborated with notable colleagues, including Yoshikazu Ito and Shigeki Tozawa. These collaborations have fostered an environment of innovation, leading to the development of cutting-edge plasma processing solutions.

Conclusion

Shunichi Iimuro exemplifies the spirit of innovation in the realm of plasma processing technology. His six patents reflect a commitment to advancing semiconductor manufacturing techniques, influencing the industry's future in significant ways. Through his work and collaborations, Iimuro continues to inspire the next generation of inventors and engineers in Japan and beyond.

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