The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2008
Filed:
Oct. 01, 2001
Yoshihide Kihara, Hsin-chu, TW;
Shin Okamoto, Hsin-chu, TW;
Koichiro Inazawa, Yamanashi, JP;
Tomoki Suemasa, Santa Clara, CA (US);
Yoshihide Kihara, Hsin-chu, TW;
Shin Okamoto, Hsin-chu, TW;
Koichiro Inazawa, Yamanashi, JP;
Tomoki Suemasa, Santa Clara, CA (US);
Tokyo Electron Limited, , JP;
Abstract
In an etching method for achieving a dual damascene structure by using at least one layer of a low-k film and at least one layer of a hard mask, a dummy film, which is ultimately not left in the dual damascene structure, is formed in at least one layer over the hard mask in order to prevent shoulder sag. By adopting this method, a dual damascene structure in which the extent of the shoulder sag at the hard mask is minimized can be achieved through etching.