Company Filing History:

16 out of 10,295

Tokyo Electron Limited

patents

1 out of 52,711

Kabushiki Kaisha Toshiba

patents

where one patent can have more than one assignee

Years Active: 1997-2022

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16 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11495439 - Plasma processing apparatus (2022-11-08),

2. 9496150 - Etching processing method (2016-11-15),

3. 9373521 - Etching processing method (2016-06-21),

4. 8641916 - Plasma etching apparatus, plasma etching method and storage medium (2014-02-04),

5. 8287750 - Plasma processing method and plasma processing apparatus (2012-10-16),

6. 7799238 - Plasma processing method and plasma processing apparatus (2010-09-21),

7. 7622390 - Method for treating a dielectric film to reduce damage (2009-11-24),

8. 7541283 - Plasma processing method and plasma processing apparatus (2009-06-02),

9. 7326650 - Method of etching dual damascene structure (2008-02-05),

10. 7300881 - Plasma etching method (2007-11-27),

11. 7119011 - Semiconductor device and manufacturing method thereof (2006-10-10),

12. 6589435 - Plasma etching method (2003-07-08),

13. 6488863 - Plasma etching method (2002-12-03),

14. 5721090 - Method of etching a substrate (1998-02-24),

15. 5705081 - Etching method (1998-01-06),

Title: The Innovative Contributions of Shin Okamoto

Introduction

Shin Okamoto is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 16 patents. His work has been instrumental in advancing the capabilities of etching processes used in various industries.

Latest Patents

Among his latest patents is a plasma processing apparatus designed for etching workpieces. This apparatus includes a container, a gas supply system for processing gas, a plasma source, and a support for holding the workpiece. It also features an exhaust system, electrode plates, insulators, a DC power supply, and a controller that manages the gas supply, plasma source, and DC power supply. The controller ensures that the DC voltage is applied to each electrode plate during or after the etching process. Another notable patent is an etching processing method that involves modifying the shape of a pattern on a mask film and etching a target film using this mask. This method utilizes a substrate processing apparatus with multiple power supplies to achieve precise etching results.

Career Highlights

Shin Okamoto has worked with notable companies such as Tokyo Electron Limited and Toshiba Corporation. His experience in these organizations has allowed him to develop and refine his innovative technologies in plasma processing.

Collaborations

Throughout his career, Okamoto has collaborated with talented individuals, including Koichiro Inazawa and Hiromasa Mochiki. These collaborations have contributed to the success of his projects and the advancement of technology in his field.

Conclusion

Shin Okamoto's contributions to plasma processing technology and his impressive portfolio of patents highlight his role as a leading inventor in the industry. His innovative work continues to influence advancements in etching processes and related technologies.

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