Kiyosu, Japan

Kohsuke Tsuchiya

This inventor holds 23 USPTO granted patents and 18 published patent applications and 18 EPO patents, primarily in Polishing Composition. Top assignees: Fujimi Incorporated, Toagosei Company, Ltd.. Active years: 2015-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kohsuke Tsuchiya. Retrieved from https://idiyas.com/inventor/kohsuke-tsuchiya

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 23 

% Patents Active = 95.7

 

Average Co-Inventor Count = 2.8

ph-index = 2

Forward Citations = 11(Granted Patents)


Location History:

  • Aichi, JP (2019 - 2020)
  • Kiyosu, JP (2015 - 2024)

Company Filing History:


Years Active: 2015-2026

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Areas of Expertise:
Polishing Composition
Silicon Wafer
Wetting Agent
Abrasive Composition
Surface Treatment
Production Method
Polishing Method
Composition Preparation
Substrate Manufacturing
Liquid Concentrate
Polishing Additive
Chemical Composition
23 patents (USPTO):Explore Patents

Title: Kohsuke Tsuchiya: Innovator in Polishing Compositions

Introduction

Kohsuke Tsuchiya, an esteemed inventor based in Kiyosu, Japan, has made significant contributions to the field of polishing compositions. With a remarkable portfolio of 21 patents, his work primarily focuses on methods and formulations aimed at improving the polishing processes, particularly for materials with silicon-silicon bonds.

Latest Patents

Among his latest innovations is a patent for a polishing composition and method for producing the same. This composition contains a water-soluble polymer and is tailored to reduce LPDs (low particle densities). Notably, it includes an abrasive, a water-soluble polymer, and a basic compound, with a strict limit on the content of a reaction product of a polymerization initiator and inhibitor set at 0.1 ppb or less, ensuring high purity and effectiveness.

Another recent patent describes a method of polishing objects composed of materials with silicon-silicon bonds. This inventive method is designed to minimize defects and haze on the polished surface. It involves a multi-step final polishing process, utilizing a specific polishing composition that meets certain haze parameter conditions. This innovative approach ensures superior results in achieving clarity and quality in polished surfaces.

Career Highlights

Kohsuke Tsuchiya has held significant positions in major companies, including Fujimi Incorporated and Toagosei Company, Ltd., where he contributed to advancements in polishing technologies. His career is marked by a commitment to research and innovation, leading to the development of high-performance polishing compositions that enhance manufacturing processes.

Collaborations

Throughout his career, Tsuchiya has collaborated with notable colleagues such as Hisanori Tansho and Yoshio Mori. These collaborations have fostered an environment of shared knowledge and innovation, driving forward the development of effective polishing methods and compositions that meet industry needs.

Conclusion

Kohsuke Tsuchiya stands out as a prolific inventor in the polishing industry. His patents reflect a deep understanding of material science and a commitment to excellence in process refinement. As he continues to innovate, Tsuchiya’s contributions will likely have lasting impacts on the field, benefiting manufacturers and users alike with superior polishing solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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