The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2026

Filed:

Jun. 09, 2021
Applicant:

Fujimi Incorporated, Kiyosu, JP;

Inventors:

Hisanori Tansho, Kiyosu, JP;

Kohsuke Tsuchiya, Kiyosu, JP;

Hiroki Yamaguchi, Kiyosu, JP;

Reiko Akizuki, Kiyosu, JP;

Ryunosuke Ando, Kiyosu, JP;

Assignee:

FUJIMI INCORPORATED, Kiyosu, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08J 3/07 (2006.01); C09G 1/02 (2006.01);
U.S. Cl.
CPC ...
C08J 3/07 (2013.01); C09G 1/02 (2013.01); C08J 2329/04 (2013.01);
Abstract

To provide a polyvinyl alcohol composition effectively suppressed in generation of an aggregated product, in a method for producing a wetting agent for a semiconductor, containing a polyvinyl alcohol composition. A method for producing a wetting agent for a semiconductor, containing a polyvinyl alcohol composition, wherein the polyvinyl alcohol composition is obtained through an addition-in-liquid step of adding into the inside of any one solution of a first liquid containing polyvinyl alcohol and water and a second liquid other than the first liquid, the other liquid of the first liquid and the second liquid.


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