For the Inventor, By the Inventor

Enter assignee name

Fujimi Incorporated

USPTO Granted Patents = 265

EPO Patents = 66

Trademarks = 2

Forward Citations = 760

Loading Chart...

Loading Chart...

207 inventors (with patents filed for the assignee):

Hiroyuki Ibe (22 out of 22 patents)

Kohsuke Tsuchiya (21 out of 21 patents)

Yukinobu Yoshizaki (20 out of 20 patents)

4. Keiji Ashitaka (20 out of 20 patents)

5. Kazusei Tamai (17 out of 17 patents)

6. Hitoshi Morinaga (17 out of 17 patents)

7. Yasuto Ishida (16 out of 16 patents)

8. Shogo Onishi (15 out of 15 patents)

9. Hiroaki Mizuno (15 out of 15 patents)

10. Satoru Yarita (14 out of 15 patents)

11. Junya Kitamura (13 out of 13 patents)

12. Katsuyoshi Ina (13 out of 13 patents)

13. Shuhei Takahashi (12 out of 17 patents)

14. Tsutomu Yoshino (11 out of 11 patents)

15. Tomohiko Akatsuka (11 out of 12 patents)

Core Competencies:

CMP Slurries

Chemical Mechanical Polishing

Additive Layer Manufacturing

Surface Treatment Composition

Silica Sol Production

Polishing Composition

Titanium Phosphate Powder

Porous Metal Oxide

Colloidal Silica

Silicon Nitride

Cosmetic Pigments

Polishing Methods

265 patents: Sort by Forward Citations

1. 12503403 - Method of producing aluminum hydroxide-coated SiC particles, dispersion solution and molded body containing same, and sintered body formed using same (2025-12-23),

2. 12497540 - Polishing composition and polishing method using the same (2025-12-16),

3. 12454629 - CMP slurries (2025-10-28),

4. 12448544 - Chemical mechanical polishing compositions and methods of use thereof (2025-10-21),

5. 12447533 - Powder material for use in additive layer manufacturing, additive layer manufacturing method using same, and molded article (2025-10-21),

6. 12404475 - Surface treatment composition, surface treatment method, and method for producing semiconductor substrate (2025-09-02),

7. 12398294 - Polishing composition, polishing method, and method of manufacturing semiconductor substrate (2025-08-26),

8. 12391848 - Polishing composition, method for producing polishing composition, polishing method, and method for producing semiconductor substrate (2025-08-19),

9. 12378437 - Polishing composition, concentrated liquid thereof, and polishing method using the same (2025-08-05),

10. 12378116 - Titanium phosphate powder, production method therefor, and white pigment for cosmetics (2025-08-05),

11. 12371331 - Method for producing silica sol (2025-07-29),

12. 12312499 - Surface treatment method, method for producing semiconductor substrate including the surface treatment method, composition for surface treatment, and system for producing semiconductor substrate including the composition for surface treatment (2025-05-27),

13. 12269970 - Polishing composition, polishing method and method for producing semiconductor substrate (2025-04-08),

14. 12264265 - Concentrated liquid of polishing composition and polishing method using same (2025-04-01),

15. 12258492 - Polishing composition, polishing method, and method for manufacturing substrate (2025-03-25),

Fujimi Incorporated is a global manufacturer of high-quality abrasives, polishing materials, and precision iridium and diamond ceramics. With over 70 years of experience, Fujimi offers a wide range of products and solutions for various industries including semiconductor, optical, automotive, and electronic components. Their mission is to provide customers with innovative and reliable materials that enhance productivity and quality in manufacturing processes.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 30 2025

265 Patents

#7 in

#560 in

#3,203 in the World

Fujimi Incorporated

Forward Citations = 760

207 inventors:

Hiroyuki Ibe (22 out of 22 patents)

Kohsuke Tsuchiya (21 out of 21 patents)

Yukinobu Yoshizaki (20 out of 20 patents)

4. Keiji Ashitaka (20 out of 20 patents)

5. Kazusei Tamai (17 out of 17 patents)

Please report any incorrect information to support@idiyas.com

Loading…