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For the Inventor, By the Inventor

Aichi, Japan

Fujimi Incorporated


USPTO Granted Patents = 266


Trademarks = 2

Forward Citations = 761

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207 inventors (with patents filed for the assignee):

goldMedal Hiroyuki Ibe (22 out of 22 patents)

silverMedal Kohsuke Tsuchiya (21 out of 21 patents)

bronzeMedal Yukinobu Yoshizaki (20 out of 20 patents)

4.  Keiji Ashitaka (20 out of 20 patents)

5.  Kazusei Tamai (17 out of 17 patents)

6.  Hitoshi Morinaga (17 out of 17 patents)

7.  Yasuto Ishida (16 out of 16 patents)

8.  Shogo Onishi (15 out of 15 patents)

9.  Hiroaki Mizuno (15 out of 15 patents)

10.  Satoru Yarita (14 out of 15 patents)

11.  Junya Kitamura (13 out of 13 patents)

12.  Katsuyoshi Ina (13 out of 13 patents)

13.  Tsutomu Yoshino (12 out of 12 patents)

14.  Shuhei Takahashi (12 out of 17 patents)

15.  Tomohiko Akatsuka (11 out of 12 patents)


Core Competencies:
CMP Slurries
Chemical Mechanical Polishing
Additive Layer Manufacturing
Surface Treatment Composition
Silica Sol Production
Polishing Composition
Titanium Phosphate Powder
Porous Metal Oxide
Colloidal Silica
Silicon Nitride
Cosmetic Pigments
Polishing Methods

266 patents:

1. 12516276 - Surface treatment composition (2026-01-06),
2. 12503403 - Method of producing aluminum hydroxide-coated SiC particles, dispersion solution and molded body containing same, and sintered body formed using same (2025-12-23),
3. 12497540 - Polishing composition and polishing method using the same (2025-12-16),
4. 12454629 - CMP slurries (2025-10-28),
5. 12448544 - Chemical mechanical polishing compositions and methods of use thereof (2025-10-21),
6. 12447533 - Powder material for use in additive layer manufacturing, additive layer manufacturing method using same, and molded article (2025-10-21),
7. 12404475 - Surface treatment composition, surface treatment method, and method for producing semiconductor substrate (2025-09-02),
8. 12398294 - Polishing composition, polishing method, and method of manufacturing semiconductor substrate (2025-08-26),
9. 12391848 - Polishing composition, method for producing polishing composition, polishing method, and method for producing semiconductor substrate (2025-08-19),
10. 12378437 - Polishing composition, concentrated liquid thereof, and polishing method using the same (2025-08-05),
11. 12378116 - Titanium phosphate powder, production method therefor, and white pigment for cosmetics (2025-08-05),
12. 12371331 - Method for producing silica sol (2025-07-29),
13. 12312499 - Surface treatment method, method for producing semiconductor substrate including the surface treatment method, composition for surface treatment, and system for producing semiconductor substrate including the composition for surface treatment (2025-05-27),
14. 12269970 - Polishing composition, polishing method and method for producing semiconductor substrate (2025-04-08),
15. 12264265 - Concentrated liquid of polishing composition and polishing method using same (2025-04-01),
Fujimi Incorporated is a global manufacturer of high-quality abrasives, polishing materials, and precision iridium and diamond ceramics. With over 70 years of experience, Fujimi offers a wide range of products and solutions for various industries including semiconductor, optical, automotive, and electronic components. Their mission is to provide customers with innovative and reliable materials that enhance productivity and quality in manufacturing processes.
This text is generated by artificial intelligence and may not be accurate.

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USPTO Data Jan 1 1976 - Jan 20 2026

266 Patents

#7 in

#557 in

#3,196 in the World

...
Aichi, Japan

Fujimi Incorporated

Forward Citations = 761

207 inventors:

goldMedal Hiroyuki Ibe (22 out of 22 patents)

silverMedal Kohsuke Tsuchiya (21 out of 21 patents)

bronzeMedal Yukinobu Yoshizaki (20 out of 20 patents)

4.  Keiji Ashitaka (20 out of 20 patents)

5.  Kazusei Tamai (17 out of 17 patents)

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