For the Inventor, By the Inventor

Enter assignee name

Fujimi Incorporated

USPTO Granted Patents = 284

% Expired Patents = 8.5

EPO Patents = 70

Trademarks = 2

Forward Citations = 770

Loading Chart...

Loading Chart...

218 inventors (with patents filed for the assignee):

Keiji Ashitaka (23 out of 23 patents)

Kohsuke Tsuchiya (23 out of 23 patents)

Hiroyuki Ibe (22 out of 22 patents)

4. Yukinobu Yoshizaki (20 out of 20 patents)

5. Hitoshi Morinaga (18 out of 18 patents)

6. Yasuto Ishida (17 out of 17 patents)

7. Kazusei Tamai (17 out of 17 patents)

8. Tsutomu Yoshino (16 out of 16 patents)

9. Shogo Onishi (16 out of 16 patents)

10. Satoru Yarita (15 out of 15 patents)

11. Hiroaki Mizuno (15 out of 15 patents)

12. Junya Kitamura (13 out of 13 patents)

13. Katsuyoshi Ina (13 out of 13 patents)

14. Shuhei Takahashi (12 out of 17 patents)

15. Tomohiko Akatsuka (12 out of 12 patents)

Core Competencies:

Polishing Composition

Silica Sol

Surface Treatment

CMP Slurries

Titanium Phosphate

Aluminum Hydroxide

Additive Layer Manufacturing

Ceramic Powder

Quaternary Ammonium

Modified Colloidal Silica

Thermal Spraying Material

Zirconia Particles

284 patents: Sort by Forward Citations

1. 12709700 - POLISHING COMPOSITION, METHOD FOR PRODUCING POLISHING COMPOSITION, AND POLISHING METHOD (2026-08-18),

2. 12709545 - SILICON CARBIDE POWDER AND MANUFACTURING METHOD FOR SAME (2026-08-18),

3. 12692459 - Composition for surface treatment, surface treatment method, and method for producing semiconductor substrate (2026-07-28),

4. 12692414 - Polishing composition, production method of polishing composition, polishing method, and manufacturing method of semiconductor substrate (2026-07-28),

5. 12686792 - Polishing composition, polishing method, and method for producing semiconductor substrate (2026-07-21),

6. 12662612 - Method for filtering polishing additive-containing liquid, polishing additive-containing liquid, polishing composition, method for producing polishing composition, and filter (2026-06-23),

7. 12649866 - Polishing composition, polishing method, and method for manufacturing semiconductor substrate (2026-06-09),

8. 12644016 - Polishing composition, polishing method and method for producing semiconductor substrate (2026-06-02),

9. 12637635 - Surface treatment composition, method for producing surface treatment composition, surface treatment method, and method for producing semiconductor substrate (2026-05-26),

10. 12637588 - Method for producing inorganic particle-containing slurry and zirconia particle-containing slurry (2026-05-26),

11. 12630743 - Polishing composition, polishing method, and method for producing semiconductor substrate (2026-05-19),

12. 12624172 - Method for producing wetting agent for semiconductor, containing polyvinyl alcohol composition, polishing composition containing wetting agent for semiconductor, obtained by the production method, and method for producing polishing composition (2026-05-12),

13. 12606718 - Polishing composition, polishing method, and method of manufacturing semiconductor substrate (2026-04-21),

14. 12606709 - Method for increasing specific surface area of titanium phosphate plate-shaped particles, and powder containing plate-shaped particles derived from titanium phosphate (2026-04-21),

15. 12606444 - Method for manufacturing silica sol (2026-04-21),

Fujimi Incorporated is a global manufacturer of high-quality abrasives, polishing materials, and precision iridium and diamond ceramics. With over 70 years of experience, Fujimi offers a wide range of products and solutions for various industries including semiconductor, optical, automotive, and electronic components. Their mission is to provide customers with innovative and reliable materials that enhance productivity and quality in manufacturing processes.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Sep 22 2026

284 Patents

#1 in Kiyosu

#557 in Japan

#3,113 in the World

Fujimi Incorporated

Forward Citations = 770

218 inventors:

Keiji Ashitaka (23 out of 23 patents)

Kohsuke Tsuchiya (23 out of 23 patents)

Hiroyuki Ibe (22 out of 22 patents)

4. Yukinobu Yoshizaki (20 out of 20 patents)

5. Hitoshi Morinaga (18 out of 18 patents)

Please report any incorrect information to [email protected]

Loading…