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Fujimi Incorporated

USPTO Granted Patents = 285

% Expired Patents = 8.4

EPO Patents = 71

Trademarks = 2

Forward Citations = 770

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218 inventors (with patents filed for the assignee):

Keiji Ashitaka (23 out of 23 patents)

Kohsuke Tsuchiya (23 out of 23 patents)

Hiroyuki Ibe (22 out of 22 patents)

4. Yukinobu Yoshizaki (20 out of 20 patents)

5. Hitoshi Morinaga (18 out of 18 patents)

6. Yasuto Ishida (17 out of 17 patents)

7. Kazusei Tamai (17 out of 17 patents)

8. Tsutomu Yoshino (16 out of 16 patents)

9. Shogo Onishi (16 out of 16 patents)

10. Satoru Yarita (15 out of 15 patents)

11. Hiroaki Mizuno (15 out of 15 patents)

12. Junya Kitamura (13 out of 13 patents)

13. Katsuyoshi Ina (13 out of 13 patents)

14. Shuhei Takahashi (12 out of 17 patents)

15. Tomohiko Akatsuka (12 out of 12 patents)

Core Competencies:

Polishing Composition

Silica Sol

Surface Treatment

CMP Slurries

Titanium Phosphate

Aluminum Hydroxide

Additive Layer Manufacturing

Ceramic Powder

Quaternary Ammonium

Modified Colloidal Silica

Thermal Spraying Material

Zirconia Particles

285 patents: Sort by Forward Citations

1. 12752252 - Absorption method and mesoporous alumina used for the same (2026-10-06),

2. 12709700 - POLISHING COMPOSITION, METHOD FOR PRODUCING POLISHING COMPOSITION, AND POLISHING METHOD (2026-08-18),

3. 12709545 - SILICON CARBIDE POWDER AND MANUFACTURING METHOD FOR SAME (2026-08-18),

4. 12692459 - Composition for surface treatment, surface treatment method, and method for producing semiconductor substrate (2026-07-28),

5. 12692414 - Polishing composition, production method of polishing composition, polishing method, and manufacturing method of semiconductor substrate (2026-07-28),

6. 12686792 - Polishing composition, polishing method, and method for producing semiconductor substrate (2026-07-21),

7. 12662612 - Method for filtering polishing additive-containing liquid, polishing additive-containing liquid, polishing composition, method for producing polishing composition, and filter (2026-06-23),

8. 12649866 - Polishing composition, polishing method, and method for manufacturing semiconductor substrate (2026-06-09),

9. 12644016 - Polishing composition, polishing method and method for producing semiconductor substrate (2026-06-02),

10. 12637635 - Surface treatment composition, method for producing surface treatment composition, surface treatment method, and method for producing semiconductor substrate (2026-05-26),

11. 12637588 - Method for producing inorganic particle-containing slurry and zirconia particle-containing slurry (2026-05-26),

12. 12630743 - Polishing composition, polishing method, and method for producing semiconductor substrate (2026-05-19),

13. 12624172 - Method for producing wetting agent for semiconductor, containing polyvinyl alcohol composition, polishing composition containing wetting agent for semiconductor, obtained by the production method, and method for producing polishing composition (2026-05-12),

14. 12606718 - Polishing composition, polishing method, and method of manufacturing semiconductor substrate (2026-04-21),

15. 12606709 - Method for increasing specific surface area of titanium phosphate plate-shaped particles, and powder containing plate-shaped particles derived from titanium phosphate (2026-04-21),

Company Overview

Fujimi Incorporated, headquartered in Kiyosu, Japan, specializes in the development and manufacturing of advanced chemical mechanical polishing (CMP) solutions. The company focuses on producing high-performance polishing compositions, including silica sol and CMP slurries, which are essential for semiconductor and electronic device fabrication. Additionally, Fujimi is engaged in surface treatment technologies and additive layer manufacturing, leveraging materials such as titanium phosphate and aluminum hydroxide to enhance product performance across various applications.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 13 2026

285 Patents

#1 in Kiyosu

#556 in Japan

#3,112 in the World

Fujimi Incorporated

Forward Citations = 770

218 inventors:

Keiji Ashitaka (23 out of 23 patents)

Kohsuke Tsuchiya (23 out of 23 patents)

Hiroyuki Ibe (22 out of 22 patents)

4. Yukinobu Yoshizaki (20 out of 20 patents)

5. Hitoshi Morinaga (18 out of 18 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Fujimi Incorporated. Retrieved from https://idiyas.com/company/fujimi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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