Kiyosu, Japan

Yukinobu Yoshizaki

This inventor holds 20 USPTO granted patents and 9 published patent applications and 1 EPO patent, primarily in Semiconductor Polishing. Top assignee: Fujimi Incorporated. Active years: 2016-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yukinobu Yoshizaki. Retrieved from https://idiyas.com/inventor/yukinobu-yoshizaki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 20 

% Patents Active = 100.0

 

Average Co-Inventor Count = 2.6

ph-index = 1

Forward Citations = 9(Granted Patents)


Location History:

  • Aichi, JP (2018 - 2022)
  • Kiyosu, JP (2016 - 2023)

Company Filing History:


Years Active: 2016-2025

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Areas of Expertise:
Polishing Composition
Surface Treatment
Semiconductor Substrate
Manufacturing Method
Production Method
Polishing Method
Composition Preparation
Surface Treatment Method
Substrate Production
20 patents (USPTO):Explore Patents

Title: **Yukinobu Yoshizaki: A Pioneer in Polishing Composition Innovations**

Introduction

Yukinobu Yoshizaki, an esteemed inventor based in Kiyosu, Japan, has made significant contributions to the field of polishing compositions, particularly for semiconductor substrates. With an impressive portfolio of 20 patents, his work is instrumental in enhancing the efficiency and quality of polishing processes in various applications.

Latest Patents

Yoshizaki's latest patents showcase his innovative approach to polishing materials. One notable patent involves a polishing composition that allows for the efficient polishing of layers containing elements from group 13 of the periodic table, specifically at a high polishing speed when the content is 40 mass % or more. This composition includes cationically modified silica, polyalkylene glycol, and an acid, making it a critical advancement for industry practices.

Another significant patent addresses the challenges of level differences during the polishing of dissimilar materials and patterns. This composition incorporates abrasive grains with an average particle size of 5 to 50 nm, featuring a level difference modifier consisting of a compound with an aromatic ring and a sulfo group or its salt directly bonded to the ring, along with a dispersing medium with a pH of less than 7. These innovations are designed to improve the uniformity of polishing, which is crucial in semiconductor manufacturing.

Career Highlights

Yukinobu Yoshizaki currently works with Fujimi Incorporated, a company renowned for its advanced materials and chemicals for the semiconductor industry. His expertise in developing polishing compositions has propelled him to be a key figure in the company's research and development initiatives. His work not only benefits Fujimi but also the broader landscape of technology that relies on high-quality semiconductor substrates.

Collaborations

In his journey, Yoshizaki collaborates with talented coworkers such as Satoru Yarita and Koichi Sakabe, contributing to a dynamic and innovative work environment. Together, they push the boundaries of what is possible in the field of polishing compositions, driving forward advancements that have wide-reaching implications in technology.

Conclusion

Yukinobu Yoshizaki stands out as a leading inventor in the realm of polishing compositions. His latest patents highlight his commitment to innovation and his ability to tackle complex challenges within the semiconductor manufacturing process. With continued collaboration and relentless pursuit of excellence, Yoshizaki is poised to make further significant contributions to the field, solidifying his legacy as a pioneer in polishing technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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