The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2022
Filed:
Mar. 11, 2021
Applicant:
Fujimi Incorporated, Aichi, JP;
Inventors:
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/02 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); H01L 21/30625 (2013.01);
Abstract
The present invention provides a polishing method in which the polishing speed of silicon germanium is sufficiently high, the etching of the silicon germanium is suppressed, and the selection ratio of the polishing speed of the silicon germanium is sufficiently high. The present invention relates a polishing method including: polishing an object to be polished containing silicon germanium using a polishing composition, in which the polishing composition contains an abrasive, an inorganic salt, and a polishing accelerator having an acid group, and pH of the polishing composition is 8 or more.