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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11028340 B1

PDFFull Text
Date of Patent:
Jun. 08, 2021

Filed:

Feb. 19, 2018

Composition for surface treatment, method for producing the same, surface treatment method using composition for surface treatment, and method for producing semiconductor substrate

Applicant:

Fujimi Incorporated, Kiyosu, JP;

Inventors:

Yasuto Ishida, Kiyosu, JP;

Tsutomu Yoshino, Kiyosu, JP;

Shogo Onishi, Kiyosu, JP;

Yukinobu Yoshizaki, Kiyosu, JP;

Assignee:

FUJIMI INCORPORATED, Kiyosu, JP;

Attorney:

Foley & Lardner LLP

Primary Examiner:

Gregory E Webb

Int. Cl.
CPC ...
C11D 3/37 (2006.01); C11D 1/00 (2006.01); C09G 1/04 (2006.01); C11D 11/00 (2006.01); C11D 17/00 (2006.01); H01L 21/02 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
C11D 1/008 (2013.01); C09G 1/04 (2013.01); C11D 3/3753 (2013.01); C11D 11/0047 (2013.01); C11D 17/0008 (2013.01); H01L 21/02057 (2013.01); H01L 21/30625 (2013.01);
Abstract

An objective of the present invention is to provide a means for sufficiently removing residues remaining on a surface of a polished object to be polished. A composition for surface treatment containing a polymer compound having at least one ionic functional group selected from the group consisting of a sulfonic acid (salt) group, a phosphoric acid (salt) group, a phosphoric acid (salt) group, and an amino group, and water, in which pH is less than 7, and the polymer compound has a pKa of 3 or less and an ionic functional group density of more than 10%.

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Ishida, Yasuto. (2021). Composition for surface treatment, method for producing the same, surface treatment method using composition for surface treatment, and method for producing semiconductor substrate (U.S. Patent No. 11028340). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11028340

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