Location History:
- Kakamigahara, JP (2014)
- Miaoli County, CN (2018)
- Aichi, JP (2020 - 2022)
- Kiyosu, JP (2016 - 2023)
Company Filing History:
Years Active: 2014-2025
Title: The Innovations of Yasuto Ishida: Pioneering Polishing Technologies
Introduction: Yasuto Ishida, an accomplished inventor based in Aichi, Japan, has made significant contributions to the field of polishing compositions. With an impressive portfolio of 14 patents, Ishida's work focuses on enhancing the quality of devices through innovative materials and methods.
Latest Patents: Among his most recent patents is a novel polishing composition that aims to improve the quality of devices. This composition includes an abrasive grain with an immobilized organic acid, a first water-soluble polymer with either a sulfonic or carboxyl group, a second distinct water-soluble polymer, a nonionic surfactant, and an aqueous carrier. The formulation is designed specifically for effective polishing applications. Another noteworthy patent is related to an intermediate raw material consisting of a charge control agent with a critical packing parameter of 0.6 or more, combined with a dispersing medium, which maintains a pH of less than 7. This innovative composition is utilized for advanced surface treatment processes.
Career Highlights: Yasuto Ishida has showcased remarkable expertise in developing effective solutions that address the complexities of polishing technologies. His dedication to research and development has undeniably shaped industry practices, contributing to better manufacturing processes and device quality.
Collaborations: Ishida has worked closely with notable colleagues in the field, including Shogo Onishi and Tsutomu Yoshino. Their collaborations exemplify a shared commitment to advancing technology and innovation in surface treatments.
Conclusion: Yasuto Ishida's contributions to polishing compositions reflect his innovative spirit and commitment to improving device quality. As his career progresses at Fujimi Incorporated, his ongoing research and development efforts are likely to continue making a significant impact in the field of polishing technologies.