The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2022
Filed:
Sep. 03, 2020
Applicant:
Fujimi Incorporated, Kiyosu, JP;
Inventors:
Assignee:
FUJIMI INCORPORATED, Kiyosu, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 3/37 (2006.01); C11D 1/00 (2006.01); C11D 11/00 (2006.01); H01L 21/321 (2006.01); B08B 3/08 (2006.01); H01L 21/02 (2006.01); H01L 21/3105 (2006.01); B08B 1/00 (2006.01);
U.S. Cl.
CPC ...
C11D 3/3773 (2013.01); B08B 1/002 (2013.01); B08B 3/08 (2013.01); C11D 1/008 (2013.01); C11D 3/3707 (2013.01); C11D 11/0047 (2013.01); H01L 21/02065 (2013.01); H01L 21/02074 (2013.01); H01L 21/31053 (2013.01); H01L 21/3212 (2013.01);
Abstract
To provide a means capable of sufficiently removing organic residues present on the surface of a polishing object after polishing containing silicon oxide or polysilicon. A surface treatment composition contains a polymer having a constituent unit represented by Formula (1) below and water and is used for treating the surface of a polishing object after polishing,