The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2022
Filed:
Nov. 19, 2020
Fujimi Incorporated, Aichi, JP;
Satoru Yarita, Aichi, JP;
Yukinobu Yoshizaki, Aichi, JP;
FUJIMI INCORPORATED, Aichi, JP;
Abstract
A polishing composition for use in polishing an object to be polished, which comprises abrasive grains, a dispersing medium, and an additive, wherein the abrasive grains are surface-modified, the additive is represented by the following formula 1: wherein in the formula 1, Xis O or NR, Xis a single bond or NR, Rto Rare each independently a hydrogen atom; a hydroxy group; a nitro group; a nitroso group; a Calkyl group optionally substituted with a carboxyl group, an amino group, or a hydroxy group; or CONH; with the proviso that Rand Rmay form a ring; when Xis a single bond, Ris not a hydrogen atom, or Rto Rare not a methyl group; and when Xis NRand three of Rto Rand Rare a hydrogen atom, the other one is not a hydrogen atom or a methyl group; and a pH is 5.0 or less. According to the present invention, a polishing composition capable of polishing not only polycrystalline silicon but also a silicon nitride film at high speed and also suppressing a polishing speed of a silicon oxide film is provided.