The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2026
Filed:
Jul. 30, 2020
Fujimi Incorporated, Kiyosu, JP;
Shinji Furuta, Kiyosu, JP;
Takashi Hayakawa, Kiyosu, JP;
Keiji Ashitaka, Kiyosu, JP;
Naoya Miwa, Kiyosu, JP;
Kohsuke Tsuchiya, Kiyosu, JP;
Hisanori Tansho, Kiyosu, JP;
Reiko Akizuki, Kiyosu, JP;
FUJIMI INCORPORATED, Kiyosu, JP;
Abstract
Provided is a method for filtering an additive-containing liquid that can achieve a polishing composition exhibiting excellent defect reducing capability while maintaining a practical filter life. The method for filtering a polishing additive-containing liquid provided by the present invention includes the step of: filtering the polishing additive-containing liquid with a filter that satisfies the following conditions (1) and (2). (1) The average pore diameter P measured by a palm porometer is 0.15 μm or less. (2) The pore diameter gradient (S/S), which is the ratio of the inlet-side average pore diameter (S) to the outlet-side average pore diameter (S), both diameters being measured through observation with an SEM, is 3 or less.