The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2026
Filed:
Apr. 26, 2022
Applicant:
Fujimi Incorporated, Aichi, JP;
Inventors:
Masashi Abe, Aichi, JP;
Toshio Shinoda, Aichi, JP;
Satoshi Ishiguro, Aichi, JP;
Satoru Yarita, Aichi, JP;
Assignee:
FUJIMI INCORPORATED, Aichi, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C01B 33/141 (2006.01); C09G 1/02 (2006.01); C09K 3/14 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); C01B 33/1417 (2013.01);
Abstract
The method for producing a polishing composition according to the present invention includes mixing a dispersion containing silica and a solution containing a silane coupling agent having a cationic group at a concentration of 0.03% by mass or more and less than 1% by mass to obtain a dispersion containing cationically modified silica.
Quick Actions:
Abe, Masashi. (2026). Method for producing polishing composition (U.S. Patent No. 12781093). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12781093
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile