Aichi, Japan

Katsuyoshi Ina


Average Co-Inventor Count = 3.1

ph-index = 9

Forward Citations = 256(Granted Patents)


Location History:

  • Aichi, JP (2000 - 2005)
  • Nishikasugai-gun, JP (2005)
  • Aichi-ken, JP (2007)

Company Filing History:


Years Active: 2000-2007

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13 patents (USPTO):Explore Patents

Title: Innovations by Katsuyoshi Ina in Semiconductor Polishing Compositions

Introduction

Katsuyoshi Ina, an accomplished inventor based in Aichi, Japan, has made significant contributions to the field of semiconductor manufacturing. With a remarkable portfolio of 13 patents, his work primarily focuses on polishing compositions that enhance the efficiency and quality of semiconductor devices.

Latest Patents

Among Katsuyoshi Ina's notable patents is a polishing composition and method for forming a wiring structure. This innovative polishing composition enables the effective polishing of semiconductors and includes a mixture of silicon dioxide, periodic acids and their salts, tetraalkyl ammonium hydroxides and chlorides, hydrochloric acid, and water, while containing minimal iron content. Additionally, another patent details a second polishing composition composed of fumed silica, periodic acids, tetraalkyl ammonium salts, ethylene glycol or propylene glycol, and water, maintaining a pH level between 1.8 and 4.0. Furthermore, Katsuyoshi has developed a polishing composition that minimizes erosion during the final polishing phase of semiconductor manufacturing, consisting of colloidal silica, periodic acid compounds, ammonia, ammonium nitrate, and water.

Career Highlights

Katsuyoshi Ina is currently employed at Fujimi Incorporated, a company recognized for its expertise in chemical solutions for semiconductor manufacturing and other precision industries. His career is distinguished by his focus on developing superior polishing technologies that advance semiconductor fabrication processes.

Collaborations

Throughout his career, Katsuyoshi has collaborated with talented professionals such as Kenji Sakai and Tadahiro Kitamura. These collaborations have resulted in significant advancements in polishing compositions, showcasing the importance of teamwork in fostering innovation.

Conclusion

Katsuyoshi Ina stands out as a dedicated inventor in the domain of semiconductor manufacturing, specifically in polishing technology. His innovative patents reflect his commitment to improving the efficiency and quality of semiconductor devices, making him a pivotal figure in his field. As technologies continue to evolve, Katsuyoshi’s contributions are expected to have lasting impacts on the industry.

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