The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2005
Filed:
Sep. 30, 2003
Applicants:
Koji Ohno, Gifu, JP;
Chiyo Horikawa, Gifu, JP;
Kenji Sakai, Aichi, JP;
Katsuyoshi Ina, Aichi, JP;
Inventors:
Assignee:
Fujimi Incorporated, Aichi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09G 102 ; C09G 104 ; H01L 21304 ;
U.S. Cl.
CPC ...
Abstract
There is provided a polishing composition that reduces erosion and is used in a final polishing step of a semiconductor device manufacturing process. The polishing composition contains colloidal silica, a periodic acid compound, ammonia, ammonium nitrate and water and its pH is 1.8 to 4.0.