The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 19, 2001
Filed:
Jul. 14, 2000
Applicant:
Inventors:
Kazusei Tamai, Aichi, JP;
Katsuyoshi Ina, Aichi, JP;
Assignee:
Fujimi Incorporated, Nishikasugai-gun, JP;
Primary Examiner:
Int. Cl.
CPC ...
C01B 3/3141 ; C09K 3/14 ; C09G 1/04 ; B01J 1/300 ;
U.S. Cl.
CPC ...
C01B 3/3141 ; C09K 3/14 ; C09G 1/04 ; B01J 1/300 ;
Abstract
A process for producing a polishing composition, which comprises preliminarily adjusting water to pH 2-4, adding from 40 to 60 wt % of fumed silica to the water under high shearing force, adding water to lower the viscosity to 2-10000 cps, stirring the mixture under low shearing force for at least 5 minutes, adding water to lower the fumed silica concentration to 10-38 wt %, and adding a basic substance under vigorous stirring to raise the pH to 9-12.