The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 2020
Filed:
May. 23, 2017
Fujimi Incorporated, Kiyosu-shi, Aichi, JP;
Toagosei Co., Ltd., Minato-ku, Tokyo, JP;
Kohsuke Tsuchiya, Kiyosu, JP;
Hisanori Tansho, Kiyosu, JP;
Taiki Ichitsubo, Kiyosu, JP;
Yoshio Mori, Kiyosu, JP;
FUJIMI INCORPORATED, Kiyosu-Shi, JP;
TOAGOSEI CO., LTD., Tokyo, JP;
Abstract
This invention provides a silicon wafer polishing composition used in the presence of an abrasive. The composition comprises a silicon wafer polishing accelerator, an amide group-containing polymer, and water. The amide group-containing polymer has a building unit A in its main chain. The building unit A comprises a main chain carbon atom constituting the main chain of the amide group-containing polymer and a secondary amide group or a tertiary amide group. The carbonyl carbon atom constituting the secondary amide group or tertiary amide group is directly coupled to the main chain carbon atom.