The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 2019
Filed:
Sep. 22, 2014
Applicant:
Fujimi Incorporated, Kiyosu-shi, Aichi, JP;
Inventors:
Kohsuke Tsuchiya, Kiyosu, JP;
Yoshio Mori, Kiyosu, JP;
Assignee:
FUJIMI INCORPORATED, Kiyosu-shi, Aichi, JP;
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C09K 3/14 (2006.01); C09G 1/04 (2006.01); C09G 1/02 (2006.01); B24B 37/00 (2012.01); B24B 37/04 (2012.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C09K 3/1463 (2013.01); B24B 37/00 (2013.01); B24B 37/044 (2013.01); C09G 1/02 (2013.01); C09G 1/04 (2013.01); C09K 3/1436 (2013.01); H01L 21/02024 (2013.01); H01L 21/02052 (2013.01);
Abstract
Provided is a polishing composition with which surface defects can be efficiently reduced. This invention provides a polishing composition comprising a water-soluble polymer M. The main chain of the water-soluble polymer Mis formed with a non-cationic region as its main structural part and a cationic region located at least at one end of the main chain. The cationic region has at least one cationic group.