The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2018
Filed:
Sep. 22, 2014
Applicant:
Fujimi Incorporated, Kiyosu-shi, Aichi, JP;
Inventors:
Kohsuke Tsuchiya, Kiyosu, JP;
Yoshio Mori, Kiyosu, JP;
Assignee:
FUJIMI INCORPORATED, Kiyosu-Shi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 13/00 (2006.01); C09K 3/14 (2006.01); B24B 37/00 (2012.01); H01L 21/02 (2006.01); B24B 37/04 (2012.01); C09G 1/04 (2006.01);
U.S. Cl.
CPC ...
C09K 3/1463 (2013.01); B24B 37/00 (2013.01); B24B 37/044 (2013.01); C09G 1/04 (2013.01); C09K 3/1436 (2013.01); H01L 21/02024 (2013.01); H01L 21/02052 (2013.01);
Abstract
Provided is a polishing composition with which haze and surface defects can be reduced. This invention provides a polishing composition comprising a synthetic water-soluble polymer Mthat has a hydrophobic region at least at one end of its main chain. The hydrophobic region has at least one hydrophobic group derived from a polymerization initiator.