Tokyo, Japan

Junji Nakamura

This inventor holds 23 USPTO granted patents and 2 EPO patents, primarily in Semiconductor Manufacturing. Top assignees: Dowa Mining Co., Ltd., Tokyo Electron Limited, Tokyo Ohka Kogyo Co., Ltd.. Active years: 1987-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Junji Nakamura. Retrieved from https://idiyas.com/inventor/junji-nakamura-nvrol69s

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 87.0


Average Co-Inventor Count = 3.0

ph-index = 6

Forward Citations = 93(Granted Patents)


Location History:

  • Shiojiri, JP (1999 - 2000)
  • Nagano, JP (2007)
  • Chiyoda-ku, JP (2010)
  • Koshi-Machi, JP (2009 - 2011)
  • Koshi, JP (2010 - 2012)
  • Tokyo, JP (1987 - 2022)
  • Kumamoto, JP (2019 - 2022)

Company Filing History:


Years Active: 1987-2025

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Areas of Expertise:
Semiconductor
Substrate Processing
Cleaning Methods
Ceramic Composites
Brazing Materials
Power Modules
Hollow-Beam Apertures
Self-Service Terminals
Washing Devices
Rinsing Methods
Metal-Ceramic Bonding
Fuel Cells
23 patents (USPTO):Explore Patents

Title: Junji Nakamura: Innovator in Semiconductor Cleaning Technologies

Introduction

Junji Nakamura, based in Tokyo, Japan, is a distinguished inventor with a remarkable portfolio of 21 patents. His innovative contributions primarily focus on cleaning compositions and methods tailored for semiconductor manufacturing, addressing critical challenges within the industry.

Latest Patents

Nakamura's latest patents include a cleaning composition designed to effectively remove layers of interest without damaging or deforming the substrate or interlayer insulation film. This innovative cleaning method integrates a cleaning composition that utilizes components capable of decomposing specific layers, exemplified by a hard mask film. Additionally, he has developed a washing method and device that enhance layer removal efficiency by allowing decomposition at elevated temperatures, where vapors of suitable components, such as nitric acid or fluorinated alkyl sulfonic acid, play a crucial role.

Career Highlights

Throughout his career, Junji Nakamura has held pivotal roles in esteemed companies like Dowa Mining Co., Ltd. and Tokyo Electron Limited. His work has been instrumental in advancing cleaning technologies that are essential for the semiconductor manufacturing process, significantly impacting production efficiency and product quality.

Collaborations

Nakamura has collaborated with notable coworkers, including Masami Sakuraba and Masami Kimura. Together, they have contributed to the research and development of innovative cleaning solutions, further enhancing the capabilities of semiconductor manufacturing equipment.

Conclusion

Junji Nakamura's impactful innovations in cleaning processes for semiconductors underscore his status as a leading inventor in the field. His numerous patents not only highlight his technical expertise but also his commitment to advancing technology in semiconductor manufacturing, paving the way for future innovations in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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