logo

For the Inventor, By the Inventor

Kawasaki, Japan

Tokyo Ohka Kogyo Co., Ltd.


USPTO Granted Patents = 1,234


Trademarks = 35

Forward Citations = 5,433

Loading Chart...
Loading Chart...

669 inventors (with patents filed for the assignee):

goldMedal Toshimasa Nakayama (111 out of 111 patents)

silverMedal Hideo Hada (92 out of 94 patents)

bronzeMedal Yoshiyuki Utsumi (70 out of 71 patents)

4.  Daiju Shiono (64 out of 64 patents)

5.  Hidekatsu Kohara (56 out of 56 patents)

6.  Takahiro Dazai (53 out of 53 patents)

7.  Hiroaki Shimizu (51 out of 55 patents)

8.  Tomoyuki Hirano (49 out of 86 patents)

9.  Takeshi Iwai (48 out of 57 patents)

10.  Tsuyoshi Nakamura (47 out of 69 patents)

11.  Masatoshi Arai (44 out of 57 patents)

12.  Dai Shiota (43 out of 43 patents)

13.  Koichi Misumi (43 out of 43 patents)

14.  Akiya Kawaue (43 out of 43 patents)

15.  Kazumasa Wakiya (42 out of 42 patents)


Core Competencies:
Film Cleaning Solution
Aqueous Cleaning Liquid
Resist Composition
Photosensitive Ink Composition
Curable Composition
Surface Treatment Liquid
Chemical Solution
Particle Capturing Device
Energy-Sensitive Composition
Hard-Mask Forming Composition
Silicon-Containing Polymer
Ruthenium-Etching Solution

1,234 patents:

1. 12498635 - Resist composition, method of forming resist pattern, and compound (2025-12-16),
2. 12485387 - Film cleaning solution and method for cleaning film (2025-12-02),
3. 12480077 - Aqueous cleaning liquid and method of cleaning electronic device (2025-11-25),
4. 12480048 - Etchant (2025-11-25),
5. 12474637 - Resist composition, method of forming resist pattern, compound, and acid diffusion controlling agent (2025-11-18),
6. 12449729 - Resist composition and method of forming resist pattern (2025-10-21),
7. 12428737 - Cleaning liquid used for cleaning metal resists, and cleaning method using cleaning liquid (2025-09-30),
8. 12428611 - Cleaning liquid used for cleaning metal resists, and cleaning method using cleaning liquid (2025-09-30),
9. 12422749 - Photosensitive ink composition, cured product, display panel, and method for producing cured product (2025-09-23),
10. 12422747 - Negative photosensitive resin composition, pattern formation method, and laminated film (2025-09-23),
11. 12421487 - Cell screening device and cell screening kit (2025-09-23),
12. 12411408 - Resist composition and method of forming resist pattern (2025-09-09),
13. 12393122 - Thinner composition and method of processing surfaces of semiconductor substrates (2025-08-19),
14. 12379664 - Photosensitive ink composition, cured product, display panel, and method for producing cured product (2025-08-05),
15. 12312489 - Curable composition, cured product and method for forming insulating film (2025-05-27),
Tokyo Ohka Kogyo Co., Ltd. is a leading manufacturer and supplier of chemicals and materials for the electronics and imaging industries. With a history of over 100 years, the company offers a wide range of products including photoresists, dry films, and semiconductor materials. Tokyo Ohka Kogyo's cutting-edge technologies and high-quality products have made them a trusted partner for many global semiconductor manufacturers. Through continuous innovation and commitment to sustainability, the company aims to contribute to the development of advanced electronics and imaging technologies.
This text is generated by artificial intelligence and may not be accurate.

logo

Company Badge

USPTO Data Jan 1 1976 - Dec 30 2025

1,234 Patents

#3 in Kawasaki

#183 in Japan

#792 in the World

...
Kawasaki, Japan

Tokyo Ohka Kogyo Co., Ltd.

Forward Citations = 5,433

669 inventors:

goldMedal Toshimasa Nakayama (111 out of 111 patents)

silverMedal Hideo Hada (92 out of 94 patents)

bronzeMedal Yoshiyuki Utsumi (70 out of 71 patents)

4.  Daiju Shiono (64 out of 64 patents)

5.  Hidekatsu Kohara (56 out of 56 patents)

Please report any incorrect information to support@idiyas.com
Loading…