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For the Inventor, By the Inventor

Kawasaki, Japan

Kazumasa Wakiya

This inventor holds 46 USPTO granted patents and 6 published patent applications, primarily in Lithography Solutions. Top assignees: Tokyo Ohka Kogyo Co., Ltd., Tokyo Ohka Kogyo., Ltd., Intel Corporation. Active years: 1990-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazumasa Wakiya. Retrieved from https://idiyas.com/inventor/kazumasa-wakiya

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 46 

% Patents Active = 80.4

Average Co-Inventor Count = 3.3

ph-index = 12

Forward Citations = 473(Granted Patents)


Location History:

  • Samukawa, JP (1990)
  • Fujisawa, JP (1999)
  • Chigasaki, JP (2003 - 2004)
  • Kanagawa, JP (1998 - 2013)
  • Kanagawa-ken, JP (1997 - 2014)
  • Kawasaki, JP (2008 - 2022)

Company Filing History:

goldMedal42 out of 1,236 
 
Tokyo Ohka Kogyo Co., Ltd.
 patents
silverMedal4 out of 30 
 
Tokyo Ohka Kogyo., Ltd.
 patents
bronzeMedal1 out of 56,365 
 
Intel Corporation
 patents
4. 1 out of 10,918 
 
Tokyo Electron Limited
 patents
where one patent can have more than one assignee

Years Active: 1990-2026

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Areas of Expertise:
Lithography
Photoresist Stripping
Cleaning Composition
Substrate Treatment
Hydrophobilization
Antireflective Coating
Dual Damascene
Pattern Formation
Coating Film
Rinsing Solution
Semiconductor Manufacturing
Resist Pattern
46 patents (USPTO):Explore Patents
1. 12742138 - Cleaning liquid and method for cleaning substrate (2026-09-22),
2. 12692412 - Method for suppressing collapse of three-dimensional structure (2026-07-28),
3. 12637638 - Rinsing solution, method of treating substrate, and method of manufacturing semiconductor device (2026-05-26),
4. 12593639 - Method for processing substrate, chemical solution, and method for providing chemical solution (2026-03-31),
5. 11441101 - Cleaning composition, cleaning method, and method for manufacturing semiconductor (2022-09-13),
6. 9244358 - Surface treatment liquid, surface treatment method, hydrophobilization method, and hydrophobilized substrate (2016-01-26),
7. 8697345 - Photoresist stripping solution and a method of stripping photoresists using the same (2014-04-15),
8. 8685910 - Cleaning liquid used in photolithography and a method for treating substrate therewith (2014-04-01),
9. 8367312 - Detergent for lithography and method of forming resist pattern with the same (2013-02-05),
10. 8354215 - Method for stripping photoresist (2013-01-15),
11. 8192923 - Photoresist stripping solution and a method of stripping photoresists using the same (2012-06-05),
12. 8158568 - Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith (2012-04-17),
13. 8124312 - Method for forming pattern, and material for forming coating film (2012-02-28),
14. 7897325 - Lithographic rinse solution and method for forming patterned resist layer using the same (2011-03-01),
15. 7846637 - Material for forming resist protective film for use in liquid immersion lithography process and method for forming resist pattern using the protective film (2010-12-07),

Title: The Innovative Journey of Kazumasa Wakiya

Introduction:

Kazumasa Wakiya is a renowned inventor hailing from Kawasaki, Japan. His groundbreaking work in the field of technology has earned him a well-deserved reputation as a pioneer in the industry.

Latest Patents:

Kazumasa Wakiya holds several patents in the realm of robotics and artificial intelligence, showcasing his commitment to pushing the boundaries of innovation. His most recent patents focus on enhancing human-robot interactions and streamlining industrial processes.

Career Highlights:

With a career spanning over two decades, Kazumasa Wakiya has worked tirelessly to bring his inventive ideas to life. His journey began in a small workshop in Kawasaki, where he tinkered with electronics and robotics, laying the foundation for his future success.

Collaborations:

Throughout his career, Kazumasa Wakiya has collaborated with leading tech companies and research institutions to further his research and development efforts. His ability to work seamlessly in interdisciplinary teams has led to the creation of cutting-edge technologies that have revolutionized the industry.

Conclusion:

In conclusion, Kazumasa Wakiya's passion for innovation and his relentless pursuit of excellence have cemented his status as a trailblazer in the world of technology. His contributions to the field will continue to inspire future generations of inventors and shape the future of robotics and artificial intelligence.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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