The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 22, 2026

Filed:

Dec. 05, 2022
Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;

Inventors:

Yukihisa Wada, Kawasaki, JP;

Kohei Serizawa, Kawasaki, JP;

Choitsu Go, Kawasaki, JP;

Kazumasa Wakiya, Kawasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C11D 17/00 (2006.01); C11D 1/04 (2006.01); C11D 1/40 (2006.01);
U.S. Cl.
CPC ...
C11D 17/0008 (2013.01); C11D 1/04 (2013.01); C11D 1/40 (2013.01); C11D 2111/16 (2024.01);
Abstract

A cleaning liquid for cleaning a substrate having a first metal atom-containing layer that contains ruthenium and a second metal atom-containing layer that contains a metal atom other than ruthenium, both of the layers contacting each other, and at least one of the first metal atom-containing layer and the second metal atom-containing layer is exposed on a surface. The cleaning liquid includes at least one of a compound represented by General Formula (a1), a hydrate of the compound, and a salt of the compound, and at least one amine other than the hydrazine compound and a quaternary hydroxide. In General Formula (a1), Rand Rrepresent an organic group including no carbonyl group or a hydrogen atom


Find Patent Forward Citations

Wada, Yukihisa. (2026). Cleaning liquid and method for cleaning substrate (U.S. Patent No. 12742138). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12742138

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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