This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Ohka Kogyo., Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Choitsu Go: Inventor in Substrate Cleaning Technology.
Introduction
Choitsu Go is an inventor based in Kawasaki, Japan, associated with Tokyo Ohka Kogyo Co., Ltd. His patent work includes a cleaning liquid and method for cleaning substrates with exposed metal-containing layers.
Latest Patents
The provided information lists one patent for Go: “Cleaning Liquid and Method for Cleaning Substrate.” The invention concerns cleaning a substrate with two contacting layers: one containing ruthenium and another containing a different metal, with at least one layer exposed at the surface. The cleaning liquid includes a specified compound, its hydrate or salt, and at least one amine other than a hydrazine compound, as well as a quaternary hydroxide. The patent describes the compound’s organic groups as containing no carbonyl group or as being hydrogen atoms. Go is credited with 1 patent in the information provided.
Career Highlights
Go’s listed patent focuses on substrate-cleaning chemistry for surfaces that include ruthenium and another metal. This work is associated with Tokyo Ohka Kogyo Co., Ltd.
Collaborations
The provided information names Yukihisa Wada and Kohei Serizawa as Go’s coworkers. Their specific roles in the patent or related work are not specified.
Conclusion
Choitsu Go’s listed invention addresses cleaning substrates with exposed, contacting metal-containing layers, including a ruthenium-containing layer. His patent reflects work associated with Tokyo Ohka Kogyo Co., Ltd. and collaborators Yukihisa Wada and Kohei Serizawa.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile