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Kawasaki, Japan

Tokyo Ohka Kogyo., Ltd.

USPTO Granted Patents = 30

EPO Patents = 3

Forward Citations = 20

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66 inventors (with patents filed for the assignee):

Kazumasa Wakiya (4 out of 46 patents)

Yukihisa Wada (3 out of 9 patents)

Takumi Namiki (3 out of 3 patents)

4. Kazuki Urakawa (3 out of 3 patents)

5. Takashi Ohsaka (2 out of 16 patents)

6. Masatoshi Arai (2 out of 59 patents)

7. Hirofumi Imai (2 out of 27 patents)

8. Satoshi Fujimura (2 out of 39 patents)

9. Takatoshi Inari (2 out of 4 patents)

10. YuehChun Liao (2 out of 2 patents)

11. Kenichi Yamagata (2 out of 3 patents)

12. Kohei Serizawa (2 out of 2 patents)

13. Dai Shiota (1 out of 44 patents)

14. Ryosuke Nakamura (1 out of 2 patents)

15. Tetsuro Kinoshita (1 out of 3 patents)

Core Competencies:

Cleaning Liquid

Resist Composition

Photosensitive Composition

Semiconductor Device

Chemical Solution

Metal Residue Removal

Surface Treatment

Curable Composition

Antibacterial Treatment

Niobium Oxide Nanocrystals

Multi-Layer Wiring

Cell Screening

30 patents: Sort by Forward Citations

1. 12769205 - Negative photosensitive composition and method for producing hollow structure (2026-10-20),

2. 12767907 - Aqueous cleaning liquid (2026-10-20),

3. 12767906 - Aqueous cleaning liquid (2026-10-20),

4. 12753366 - Cleaning solution, method for cleaning substrate, and method for manufacturing semiconductor (2026-10-06),

5. 12753087 - Nanoparticles, dispersion of nanoparticles, and production method of nanoparticles (2026-10-06),

6. 12742138 - Cleaning liquid and method for cleaning substrate (2026-09-22),

7. 12736875 - Resist composition and method for forming resist pattern (2026-09-15),

8. 12730376 - Photosensitive composition (2026-09-08),

9. 12692412 - Method for suppressing collapse of three-dimensional structure (2026-07-28),

10. 12692380 - Polymerizable composition and manufacturing method for element-mounted substrate (2026-07-28),

11. 12690420 - Semiconductor device production method (2026-07-21),

12. 12680172 - Chemical solution for removing precious metal, method for manufacturing chemical solution, method for treating substrate, method for manufacturing semiconductor device (2026-07-14),

13. 12667847 - Cell screening device and cell screening kit (2026-06-30),

14. 12655370 - Metal residue removing liquid, metal residue removing method, and metal wiring manufacturing method (2026-06-16),

15. 12649807 - Composition and cured product (2026-06-09),

Company Overview

Tokyo Ohka Kogyo, Ltd. is a prominent Japanese company specializing in the development and manufacturing of advanced materials and chemicals for the semiconductor industry. The organization focuses on producing photoresists, which are essential for photolithography processes in semiconductor fabrication. With a strong emphasis on research and innovation, Tokyo Ohka Kogyo contributes significantly to the advancement of microelectronics, serving a global clientele and playing a vital role in the technology supply chain.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 20 2026

30 Patents

#32 in Kawasaki

#2,307 in Japan

#21,912 in the World

Kawasaki, Japan

Tokyo Ohka Kogyo., Ltd.

Forward Citations = 20

66 inventors:

Kazumasa Wakiya (4 out of 46 patents)

Yukihisa Wada (3 out of 9 patents)

Takumi Namiki (3 out of 3 patents)

4. Kazuki Urakawa (3 out of 3 patents)

5. Takashi Ohsaka (2 out of 16 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Tokyo Ohka Kogyo., Ltd.. Retrieved from https://idiyas.com/company/tokyo-ohka-kogyo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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