The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 06, 2026

Filed:

Jun. 07, 2024
Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;

Inventors:

Moe Nishijima, Kawasaki, JP;

Kohei Serizawa, Kawasaki, JP;

Emi Uchida, Kawasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 3/00 (2006.01); C11D 3/30 (2006.01); H10P 70/00 (2026.01);
U.S. Cl.
CPC ...
C11D 3/0073 (2013.01); C11D 3/30 (2013.01); H10P 70/277 (2026.01); C11D 2111/22 (2024.01);
Abstract

A cleaning solution, a method for cleaning a substrate, and a method for manufacturing a semiconductor. The cleaning solution includes at least one of a compound a1 represented by a general formula (a1), a salt of the compound (a1), a hydrate of the compound (a1), hydrogen iodide, borane, and a complex of the borane; an amine compound that has 4 or more carbon atoms and is not the compound a1, or a salt thereof; and an anticorrosive agent, in which Rand Reach independently represents an organic group that does not contain a carbonyl group, or a hydrogen atom.


Find Patent Forward Citations

Nishijima, Moe. (2026). Cleaning solution, method for cleaning substrate, and method for manufacturing semiconductor (U.S. Patent No. 12753366). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12753366

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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